IP Library Granted Patent US 9,042,418
Granted Patent B2
US 9,042,418 · App. 14/139,799 · Granted May 26, 2015

III-V photonic crystal microlaser bonded on silicon-on-insulator

Inventors: Seheon Kim (San Jose, CA); William Dos Santos Fegadolli (Pasadena, CA); Axel Scherer (Barnard, VT)
Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGY
H01S5/1042H01S5/021H01S5/026H01S5/0425H01S5/105H01S5/3213H01S5/34306B82Y20/00
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Quick Facts
Patent No.
US 9,042,418
App. No.
14/139,799
Granted
May 26, 2015
Kind
B2
Abstract

Novel methods and systems for miniaturized lasers are described. A photonic crystal is bonded to a silicon-on-insulator wafer. The photonic crystal includes air-holes and can include a waveguide which couples the laser output to a silicon waveguide.

Claims (29)

1. A photonic crystal microlaser structure, the structure comprising:

a crystalline silicon substrate;

a first electrode;

a silicon layer, physically contacting the first electrode;

a silicon dioxide layer, physically contacting the silicon layer and the crystalline silicon substrate;

a silicon photonic crystal region, physically contacting the silicon dioxide layer;

a III-V semiconductor photonic crystal region, physically contacting the silicon photonic crystal region; and

a second electrode, physically contacting the III-V semiconductor photonic crystal region;

wherein the III-V semiconductor photonic crystal region comprises:

an n-type layer, physically contacting the silicon photonic crystal region;

a quantum well layer between the n-type layer and a p-type layer;

the p-type layer, physically contacting the quantum well layer; and

a III-V semiconductor substrate, physically contacting the p-type layer,

wherein the n-type layer is an n-InGaAsP layer, the quantum well layer is a InGaAsP layer, the p-type layer is a p-InGaAsP layer, and the III-V semiconductor substrate is a InP substrate, and

wherein a portion of the III-V semiconductor photonic crystal region and a portion of the silicon photonic crystal region are shaped in a mesa structure.

2. The photonic crystal microlaser structure of claim 1 , wherein the III-V semiconductor photonic crystal region further comprises barrier layers between the n-type layer and the quantum well layer, and between the quantum well layer and the p-type layer.

3. The photonic crystal microlaser structure of claim 1 , wherein the mesa structure is hexagonal.

4. The photonic crystal microlaser structure of claim 3 , further comprising:

a photonic crystal resonator in a center of the mesa structure;

a photonic crystal waveguide between one lateral edge and the center of the mesa structure, thereby coupling a laser output from the photonic crystal resonator to the photonic crystal waveguide; and

a silicon ridge waveguide, coupled to the photonic crystal waveguide.

5. The photonic crystal microlaser structure of claim 4 , wherein the mesa structure comprises:

the III-V semiconductor substrate;

the p-type layer; and

the quantum well layer,

wherein

the second electrode physically contacts the III-V semiconductor substrate, and

the first electrode physically contacts the n-type layer.

6. The photonic crystal microlaser structure of claim 5 , wherein the mesa structure further comprises the second electrode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 5, 2014
From: KIM, SEHEON; DOS SANTOS FEGADOLLI, WILLIAM; SCHERER, AXEL
To: CALIFORNIA INSTITUTE OF TECHNOLOGY
Reel/Frame 032150/0390 →
Continuity (2)
Provisional Application 61763095 · Feb 11, 2013
Related Publication 20140226691A1 · Aug 14, 2014