Cold plasma annular array methods and apparatus
Methods and apparatus are described that use an array of two or more cold plasma jet ports oriented to converge at a treatment area. The use of an array permits greater tissue penetration by cold plasma treatments. This approach enables treatment of deeper infections of soft and hard tissues without surgical intervention. For example, this approach can treat sub-integumental infections, such as those common to joint replacements, without surgically opening the issues overlying the deeper infection.
1. An apparatus comprising:
an annular structure having two or more cold plasma devices positioned to provide converging cold plasma jets that converge at a treatment area, wherein at least one of the two or more cold plasma devices is coupled to one or more high voltage RF power supplies.
2. The apparatus of claim 1 , wherein the two or more cold plasma devices are positioned in a circumferential orientation.
3. The apparatus of claim 1 , wherein the annular structure is configured to expand in a first direction.
4. The apparatus of claim 1 , wherein the annular structure is configured to expand in a first direction and in a second direction.
5. The apparatus of claim 4 , wherein the first direction and the second direction are orthogonal directions.
6. The apparatus of claim 1 , wherein the two or more cold plasma devices are configured to generate two or more cold plasma jets that are diametrically opposed to one another, the treatment area being located between the two or more cold plasma devices.
7. The apparatus of claim 1 , wherein the two or more cold plasma devices are coupled to a common triggering mechanism to simultaneously activate the two or more cold plasma devices.
8. The apparatus of claim 1 , wherein functionality settings of the two or more cold plasma devices are independently configurable to provide a desired treatment regime at the treatment area.
9. The apparatus of claim 8 , wherein the functionality settings of the two or more cold plasma devices include functionality settings by using computer control.
10. The apparatus of claim 1 , wherein at least one of the two or more cold plasma devices is a multi-frequency harmonic-rich cold plasma device.
11. The apparatus of claim 1 , wherein at least one of the two or more cold plasma devices is free of internal ground electrodes.
12. The apparatus of claim 1 , wherein the annular structure is configured to surround the treatment area.
13. A method comprising:
receiving, from a cold plasma power supply, electrical energy at two or more cold plasma devices, wherein the two or more cold plasma devices are located on an annular structure, and wherein the cold plasma power supply is a harmonic high voltage RF power supply;
receiving, from a gas source, gas at the two or more cold plasma devices; and
outputting cold plasma from the two or more cold plasma devices to converge at a treatment area.
14. The method of claim 13 , wherein the two or more cold plasma devices are located in a circumferential orientation.
15. The method of claim 13 , wherein the annular structure is configured to expand in a first direction.
16. The method of claim 13 , wherein the annular structure is configured to expand in a first direction and in a second direction.
17. The apparatus of claim 16 , wherein the first direction and the second direction are orthogonal directions.
18. The method of claim 13 , wherein outputting cold plasma from the two or more cold plasma devices includes outputting cold plasma in jets that are diametrically opposed to one another, the treatment area being located between the two or more cold plasma devices.
19. The method of claim 13 , wherein the two or more cold plasma devices are coupled to a common triggering mechanism to simultaneously activate the two or more cold plasma devices.
20. The method of claim 13 , wherein functionality settings of the two or more cold plasma devices are independently configurable to provide a desired treatment regime.
21. The method of claim 20 , wherein the functionality settings of the two or more cold plasma devices include functionality settings by using computer control.
22. The method of claim 13 , wherein at least one of the two or more cold plasma devices is a multi-frequency harmonic-rich cold plasma device, and outputting cold plasma includes outputting multi-frequency harmonic-rich cold plasma.
23. The method of claim 13 , wherein receiving electrical energy at two or more cold plasma devices includes receiving electrical energy at at least one of the two or more cold plasma devices, wherein the at least one of the two or more cold plasma devices is free of internal ground electrodes.
24. The method of claim 13 , wherein the annular structure is configured to surround the treatment area.