IP Library Granted Patent US 8,865,570
Granted Patent B2
US 8,865,570 · App. 14/146,080 · Granted Oct 21, 2014

Chips with high fracture toughness through a metal ring

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Quick Facts
Patent No.
US 8,865,570
App. No.
14/146,080
Granted
Oct 21, 2014
Kind
B2
Abstract

A method of making an edge-reinforced microelectronic element is disclosed. The steps include mechanically cutting along dicing lanes of a substrate at least partially through a thickness thereof to form a plurality of edge surfaces extending away from a front surface thereof and forming a continuous monolithic metallic edge-reinforcement ring that covers each of the plurality of edge surfaces and extends onto the front surface. The front surface may have a plurality of contacts thereat and the substrate may embody a plurality of microelectronic elements.

Claims (13)

1. A method of making an edge-reinforced microelectronic element, comprising:

mechanically cutting along dicing lanes of a substrate at least partially through a thickness thereof to form a plurality of edge surfaces extending away from a front surface thereof the front surface having a plurality of contacts thereat, the substrate further including an exposed rear surface separated from the front surface by a semiconductor material and by wiring, the substrate embodying a plurality of microelectronic elements; and

forming a continuous monolithic metallic edge-reinforcement ring covering each of the plurality of edge surfaces and extending onto the front surface.

2. The method of claim 1 , wherein the step of mechanically cutting includes sawing.

3. The method of claim 1 , wherein the step of mechanically cutting fully cuts through the thickness to separate the microelectronic elements from one another.

4. The method of claim 3 , wherein the step of forming a continuous monolithic metallic edge-reinforcement ring occurs after the step of mechanically cutting.

5. The method of claim 1 , wherein the step of mechanically cutting partially cuts through the thickness; and wherein the step of forming occurs after the step of mechanically cutting.

6. The method of claim 5 , wherein during the step of mechanically cutting, a groove is formed, the groove having a base and the edge surfaces; and wherein the step of forming a continuous monolithic metallic edge-reinforcement right includes providing a metal along the base and the edge surfaces of the groove.

7. A method of making an edge-reinforced microelectronic element, comprising:

mechanically cutting along dicing lanes of a substrate partially through a thickness thereof to expose a plurality of edge surfaces extending away from a front surface thereof the first surface having a plurality of contacts thereat, the substrate further including an exposed rear surface separated from the front surface by a semiconductor material and by wiring, the substrate embodying a plurality of microelectronic elements;

forming a continuous monolithic metallic edge-reinforcement ring covering each of the plurality of edge surfaces and extending onto the front surface; and

separating the microelectronic elements from one another along the dicing lanes.

8. The method of claim 7 , wherein the step of mechanically cutting includes sawing.

Assignments (6)
CHANGE OF NAME Recorded Nov 24, 2025
From: INVENSAS CORPORATION
To: INVENSAS LLC
Reel/Frame 073689/0754 →
CHANGE OF NAME Recorded Nov 24, 2025
From: INVENSAS LLC
To: ADEIA SEMICONDUCTOR TECHNOLOGIES LLC
Reel/Frame 073689/0786 →
RELEASE OF SECURITY INTEREST Recorded Jun 11, 2020
From: ROYAL BANK OF CANADA
To: TESSERA, INC.; INVENSAS BONDING TECHNOLOGIES, INC. (F/K/A ZIPTRONIX, INC.); FOTONATION CORPORATION (F/K/A DIGITALOPTICS CORPORATION AND F/K/A DIGITALOPTICS CORPORATION MEMS); INVENSAS CORPORATION; TESSERA ADVANCED TECHNOLOGIES, INC; DTS, INC.; DTS LLC; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
Reel/Frame 052920/0001 →
SECURITY INTEREST Recorded Jun 1, 2020
From: ROVI SOLUTIONS CORPORATION; ROVI TECHNOLOGIES CORPORATION; ROVI GUIDES, INC.; TIVO SOLUTIONS INC.; VEVEO, INC.; INVENSAS CORPORATION; INVENSAS BONDING TECHNOLOGIES, INC.; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: BANK OF AMERICA, N.A.
Reel/Frame 053468/0001 →
SECURITY INTEREST Recorded Dec 2, 2016
From: INVENSAS CORPORATION; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; ZIPTRONIX, INC.; DIGITALOPTICS CORPORATION; DIGITALOPTICS CORPORATION MEMS; DTS, LLC; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: ROYAL BANK OF CANADA, AS COLLATERAL AGENT
Reel/Frame 040797/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 10, 2014
From: MOHAMMED, ILYAS
To: INVENSAS CORPORATION
Reel/Frame 032647/0361 →