IP Library Granted Patent US 9,429,998
Granted Patent B2
US 9,429,998 · App. 14/152,732 · Granted Aug 30, 2016

Method of fabricating flexible electronic devices

Inventors: QiGuo Zhang (Shanghai, CN); ChengPei Huang (Shanghai, CN); ChuWang Huang (Shanghai, CN)
Assignee: EVERDISPLAY OPTRONICS (SHANGHAI) LIMITED
G06F1/1652Y10T29/49155
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Quick Facts
Patent No.
US 9,429,998
App. No.
14/152,732
Granted
Aug 30, 2016
Kind
B2
Abstract

The present disclosure is related to a method of fabricating display panels, especially to a method of fabricating flexible electronic devices. By means of adding an inorganic membrane with surface roughness between a bonding layer and a PI film, in order to effectively improve the dimensional stability of plastic substrate and the water/oxygen barrier property of flexible substrate during the PI film fabrication and the follow-up process, improving the yield of good products and prolonging the working life thereof.

Claims (14)

1. A method of fabricating flexible electronic devices, comprising:

(a) forming a separating layer on a substrate, wherein the separating layer partly covers the substrate;

(b) depositing an inorganic membrane having a rough upper surface to cover the side walls and the upper surface of the separating layer, and also to cover the exposed part of the upper surface of the substrate;

(c) coating a precursor of plastic substrate to cover the side walls and the upper surface of the inorganic membrane, and to partly cover the exposed part of the upper surface of the substrate; after solidification, forming a display device substrate from the plastic substrate; and

(d) fabricating electronic components on surface of the display device substrate.

2. The method as disclosed in claim 1 , wherein the inorganic membrane is formed by means of Plasma Enhanced Chemical Vapor Deposition process.

3. The method as disclosed in claim 1 , wherein the inorganic membrane is quickly formed by means of powder of Plasma Excitation, at temperature lower than 200° C., with mixture gas which silane predominates.

4. The method as disclosed in claim 1 , wherein the thickness of the inorganic membrane is less that 300 nm.

5. The method as disclosed in claim 1 , wherein the material of the inorganic membrane is amorphous silicon or silicon nitride.

6. The method as disclosed in claim 1 , wherein adhesive force between the separating layer and the substrate is less than a preconfigured value.

7. The method as disclosed in claim 1 , wherein the upper surface of the inorganic membrane is rough.

8. A method as disclosed in claim 1 , wherein the separating layer is double sided adhesive material.

9. The method as disclosed in claim 1 , wherein the roughness of the upper surface of the inorganic membrane is more that or equal to Rz 0.2 μm and less than or equal to Rz 0.3 μm.

10. The method as disclosed in claim 1 , wherein the substrate is a rigid substrate, the material of the rigid substrate is glass.

Assignments (2)
CHANGE OF NAME Recorded Aug 4, 2020
From: EVERDISPLAY OPTRONICS (SHANGHAI) LIMITED
To: EVERDISPLAY OPTRONICS (SHANGHAI) CO., LTD.
Reel/Frame 053395/0865 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 10, 2014
From: ZHANG, QIGUO; HUANG, CHENGPEI; HUANG, CHU WANG
To: EVERDISPLAY OPTRONICS (SHANGHAI) LIMITED
Reel/Frame 031943/0778 →
Priority Claims (1)
CN 2013 1 0073718 · Mar 8, 2013 · national
Continuity (1)
Related Publication 20140250687A1 · Sep 11, 2014