Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method

1. A charged particle beam writing apparatus comprising:

an emission unit configured to emit a charged particle beam;

an electron lens configured to converge the charged particle beam;

a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, configured to deflect the charged particle beam in a case of performing a blanking control of switching between beam-on and beam-off;

a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, configured to block the charged particle beam having been deflected to be in a beam-off state;

a magnet coil, in addition to the blanking deflector, configured to deflect the charged particle beam, said magnet coil provided separately from and surrounding the blanking deflector and arranged in a center height position of the blanking deflector, wherein the magnet coil deflects the charged particle beam so that a beam trajectory deflected by the magnet coil is to be the same as a beam trajectory deflected by the blanking deflector for which blanking deflection in the extent not to trigger a beam-off state is performed by the blanking deflector;

an amplifier configured to apply a deflection voltage to the blanking deflector; and

a coil control unit configured to supply a current for a deflection to the magnet coil, the coil control unit provided separately from the amplifier.

2. The apparatus according to claim 1 ,

wherein the charged particle beam is deflected, while passing through the blanking deflector, by the magnet coil.

3. The apparatus according to claim 2 ,

wherein the charged particle beam having been deflected by the magnet coil is variably shaped to irradiate a target object.