IP Library Granted Patent US 8,980,692
Granted Patent B2
US 8,980,692 · App. 14/156,671 · Granted Mar 17, 2015

Semiconductor device manufacturing method

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Quick Facts
Patent No.
US 8,980,692
App. No.
14/156,671
Granted
Mar 17, 2015
Kind
B2
Abstract

A semiconductor device includes a circuit substrate, a first semiconductor chip disposed on the circuit substrate, a plurality of first spacers disposed on the first semiconductor chip, a second semiconductor chip which includes a first adhesive agent layer on a lower face thereof and is disposed on upper portions of the plurality of spacers, a wire which connects the circuit substrate to the first semiconductor chip, and a first sealing material which seals a gap between the first semiconductor chip and the first adhesive agent layer, wherein each height of the plurality of the first spacers is greater than height of the wire relative to an upper face of the first semiconductor chip.

Claims (15)

1. A semiconductor device manufacturing method comprising:

mounting a second semiconductor chip including a first adhesive agent layer, which is thermoplastic and disposed on a lower face thereof, on a spacer directly adhered to an upper face of a first semiconductor chip disposed on a circuit substrate; and

adhering the second semiconductor chip to the spacer after the mounting of the second semiconductor by pressing the second semiconductor chip mounted on the spacer onto the spacer while heating the first adhesive agent layer.

2. A semiconductor device manufacturing method comprising:

mounting a heat sink including an adhesive agent layer, which is thermoplastic and disposed on a lower face thereof, on a spacer directly adhered to an upper face of a semiconductor chip disposed on a circuit substrate; and

adhering the heat sink to the spacer after the mounting of the heat sink by pressing the heat sink mounted on the spacer onto the spacer while heating the adhesive agent layer.

3. The semiconductor device manufacturing method according to claim 1 , further comprising:

prior to the mounting, adhering one end of a bonding wire to the upper face of the first semiconductor chip,

wherein, in the adhering of the second semiconductor chip, burying a portion of the spacer and a portion of the bonding wire into the adhesive agent layer by pressing the second semiconductor chip onto the first semiconductor chip while heating the first adhesive agent layer.

4. The semiconductor device manufacturing method according to claim 2 , further comprising:

prior to the mounting, adhering one end of a bonding wire to the upper face of the first semiconductor chip,

wherein, in the adhering of the heat sink, burying a portion of the spacer and a portion of the bonding wire into the adhesive agent layer by pressing the heat sink onto the semiconductor chip while heating the first adhesive agent layer.

5. The semiconductor device manufacturing method according to claim 1 , further comprising:

prior to the mounting, adhering a first ball formed on a tip portion of a bonding wire directly to an adhesive pad disposed on a surface of the first semiconductor chip; and

adhering a second ball to the first ball to form the spacer.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 17, 2015
From: FUJITSU SEMICONDUCTOR LIMITED
To: SOCIONEXT INC.
Reel/Frame 035453/0904 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 16, 2015
From: FUKASAWA, NORIO
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 034780/0259 →