IP Library Granted Patent US 9,178,133
Granted Patent B2
US 9,178,133 · App. 14/160,419 · Granted Nov 3, 2015

Magnetoresistive element using specific underlayer material

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Quick Facts
Patent No.
US 9,178,133
App. No.
14/160,419
Granted
Nov 3, 2015
Kind
B2
Abstract

According to one embodiment, a magnetoresistive element includes a recording layer having magnetic anisotropy perpendicular to a film surface and having a variable magnetization direction, a reference layer having magnetic anisotropy perpendicular to a film surface and having an invariable magnetization direction, an intermediate layer provided between the recording layer and the reference layer, and a underlayer containing AlTiN and provided on an opposite side of a surface of the recording layer on which the intermediate layer is provided.

Claims (54)

1. A magnetoresistive element comprising:

a recording layer having magnetic anisotropy perpendicular to a film surface and having a variable magnetization direction;

a reference layer having magnetic anisotropy perpendicular to a film surface and having an invariable magnetization direction;

an intermediate layer provided between the recording layer and the reference layer; and

an underlayer containing AlTiN and provided on an opposite side of a surface of the recording layer on which the intermediate layer is provided, wherein the underlayer comprises an amorphous structure, and contains one element selected from the group consisting of O, B and C.

2. The element according to claim 1 , wherein

the recording layer contains FeB, Fe, or CoFe or CoFeB in which a concentration of Fe is higher than that of Co.

3. The element according to claim 1 , wherein

the recording layer includes a nonmagnetic layer containing one element selected from the group consisting of Nb, Hf, W, Zr, Ti, Al, Si, Ta, Y, and La, or contains one element selected from the group consisting of Nb, Hf, W, Zr, Ti, Al, Si, Ta, Y, and La.

4. The element according to claim 1 , wherein

the recording layer includes

a first magnetic layer provided on the underlayer side and containing FeB, CoB, or CoFeB in which a concentration of Co is higher than that of Fe, and

a second magnetic layer provided on the intermediate layer side and containing FeB or CoFeB in which a concentration of Fe is higher than that of Co.

5. The element according to claim 1 , further comprising

a lower electrode provided on an opposite side of a surface of the underlayer on which the recording layer is provided, being in direct contact with the opposite side, and containing one element selected from the group consisting of Mg, Al, Si, Ti, V, Cr, Zr, Nb, Hf, Ta, W, Ge, and Ga.

6. The element according to claim 5 , wherein

the lower electrode contains one element selected from the group consisting of O, N, B, and C.

7. The element according to claim 1 , wherein a ratio between AlTi and N of AlTiN of the underlayer is 1:1.

8. The element according to claim 1 , wherein if the underlayer is made of Al (100-X) Ti X N, 10≦X≦50.

9. A magnetoresistive element comprising:

a recording layer having magnetic anisotropy perpendicular to a film surface and having a variable magnetization direction, wherein the recording layer contains FeB, Fe, or CoFe or CoFeB;

a reference layer having magnetic anisotropy perpendicular to a film surface and having an invariable magnetization direction;

an intermediate layer provided between the recording layer and the reference layer;

an underlayer made of TiN and provided on an opposite side of a surface of the recording layer on which the intermediate layer is provided, wherein the underlayer contains one element selected from the group consisting of O and C; and

a lower electrode provided on an opposite side of a surface of the underlayer on which the recording layer is provided, being in direct contact with the opposite side, and containing one element selected from the group consisting of Al, Si, Ti, V, Cr, Zr, Nb, Hf, Ta, W, Ge, Ga, B, and Mg.

10. The element according to claim 9 , wherein

a concentration of Fe in the CoFe or CoFeB is higher than that of Co in the CoFe or CoFeB.

11. The element according to claim 9 , wherein

the recording layer includes a nonmagnetic layer containing one element selected from the group consisting of Nb, Hf, W, Zr, Ti, Al, Si, Ta, Y, and La, or contains one element selected from the group consisting of Nb, Hf, W, Zr, Ti, Al, Si, Ta, Y, and La.

12. The element according to claim 9 , wherein

the recording layer includes

a first magnetic layer provided on the underlayer side and containing FeB, CoB, or CoFeB in which a concentration of Co is higher than that of Fe, and

a second magnetic layer provided on the intermediate layer side and containing FeB or CoFeB in which a concentration of Fe is higher than that of Co.

13. The element according to claim 9 , wherein

the lower electrode contains one element selected from the group consisting of O, N, B, and C.

14. The element according to claim 9 , wherein

the underlayer is in direct contact with the lower electrode.

15. The element according to claim 9 , wherein

the underlayer comprises an amorphous structure.

16. A magnetoresistive element comprising:

a recording layer having magnetic anisotropy perpendicular to a film surface and having a variable magnetization direction;

a reference layer having magnetic anisotropy perpendicular to a film surface and having an invariable magnetization direction;

an intermediate layer provided between the recording layer and the reference layer; and

an underlayer made of a boride containing one element selected from the group consisting of Al, Si, Ti, V, Cr, Zr, Nb, Hf, Ta, W, Ge, and Ga and provided on an opposite side of a surface of the recording layer on which the intermediate layer is provided, wherein the underlayer contains one element selected from the group consisting of O and C.

17. The element according to claim 16 , wherein

the recording layer contains FeB, Fe, or CoFe or CoFeB in which a concentration of Fe is higher than that of Co.

18. The element according to claim 16 , wherein

the recording layer includes a nonmagnetic layer containing one element selected from the group consisting of Nb, Hf, W, Zr, Ti, Al, Si, Ta, Y, and La, or contains one element selected from the group consisting of Nb, Hf, W, Zr, Ti, Al, Si, Ta, Y, and La.

19. The element according to claim 16 , wherein

the recording layer includes

a first magnetic layer provided on the underlayer side and containing FeB, CoB, or CoFeB in which a concentration of Co is higher than that of Fe, and

a second magnetic layer provided on the intermediate layer side and containing FeB or CoFeB in which a concentration of Fe is higher than that of Co.

20. The element according to claim 16 , wherein

the underlayer comprises an amorphous structure.

Assignments (4)
DE-MERGER Recorded Dec 12, 2019
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051260/0291 →
MERGER Recorded Dec 12, 2019
From: TOSHIBA MEMORY CORPORATION; K.K PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051262/0776 →
CHANGE OF NAME AND ADDRESS Recorded Dec 12, 2019
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 051262/0881 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 21, 2014
From: KITAGAWA, EIJI; KAI, TADASHI; YODA, HIROAKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 032499/0161 →