TWO-SIDED LASER PATTERNING ON THIN FILM SUBSTRATES
Disclosed herein are double-sided transparent conductive films suitable for patterning by laser ablation.
1 . A double-sided transparent conductive film comprising:
a beam-blocking substrate having a first surface and a second surface opposite to the first surface;
a first conductive layer disposed on the first surface, the first conductive layer comprising a first plurality of conductive nanostructures;
a second conductive layer disposed on the second surface, the second conductive layer comprising a second plurality of conductive nanostructures, wherein the beam-blocking substrate is capable of blocking a laser beam having wavelengths in the range of 180 nm-1 mm.
2 . The double-sided transparent conductive film of claim 1 wherein the beam-blocking substrate is capable of transmitting visible light (400-700 nm).
3 . The double-sided transparent conductive film of claim 1 wherein the beam-blocking substrate comprises one or more beam-blocking agents.
4 . The double-sided transparent conductive film of claim 1 wherein the beam-blocking substrate blocks IR light.
5 . The double-sided transparent conductive film of claim 4 wherein the beam-blocking substrate is an IR-blocking layer comprising one or more IR dyes.
6 . The double-sided transparent conductive film of claim 1 wherein the beam-blocking substrate comprises a UV-blocking layer.
7 . The double-sided transparent conductive film of claim 6 wherein the UV-blocking layer comprises one or more UV-blocking agents comprises a chemical moiety selected from: salicylate, benzophenone, benzotriazole, thiazine, benzotriazine, and substituted acrylonitrile.
8 . The double-sided transparent conductive film of claim 6 , wherein the UV-blocking layer is a polyethylene terephthalate film comprising an UV-blocking agent.
9 . The double-sided transparent conductive film of claim 1 , wherein the conductive nanostructures are metal nanowires.
10 . The double-sided transparent conductive film of claim 1 further comprising:
a first beam-blocking coating interposed between the first conductive layer and the beam-blocking substrate; and
a second beam-blocking coating interposed between the second conductive layer and the beam-blocking substrate.
11 . The double-sided transparent conductive film of claim 10 wherein the first beam-blocking coating and/or the second beam-blocking coating comprises one or more beam-blocking agents.
12 . A double-sided transparent conductive film comprises:
a first substrate;
a first conductive layer disposed on the first substrate, the first conductive layer comprising a first plurality of conductive nanostructures;
a second substrate;
a second conductive layer disposed on the second substrate, the second conductive layer comprising a second plurality of conductive nanostructures; and
a beam-blocking adhesive layer disposed between the first substrate and the second substrate, the beam-blocking adhesive layer and the first conductive layer being on opposite sides of the first substrate, and the beam-blocking adhesive layer and the second conductive layer being on opposite sides of the second substrate, wherein the beam-blocking adhesive layer is capable of blocking a laser beam having wavelengths in the range of 180 nm-1 mm.
13 . The double-sided transparent conductive film of claims 12 wherein the beam-blocking adhesive layer blocks IR light (700 nm-1 mm).
14 . The double-sided transparent conductive film of claim 13 13 wherein the beam-blocking adhesive layer is an IR-blocking layer comprising one or more IR dyes.
15 . The double-sided transparent conductive film of claims 12 wherein the beam-blocking adhesive layer blocks UV light (180-400 nm).
16 . The double-sided transparent conductive film of claim 15 wherein the beam-blocking adhesive layer comprises one or more UV-blocking agents comprises a chemical moiety selected from: salicylate, benzophenone, benzotriazole, thiazine, benzotriazine, and substituted acrylonitrile.
17 . The double-sided transparent conductive film of claim 12 further comprising:
a first beam-blocking coating interposed between the first conductive layer and the first substrate; and
a second beam-blocking coating interposed between the second conductive layer and the second substrate.
18 . The double-sided transparent conductive film of claim 17 wherein the first beam-blocking coating and the second beam-blocking coating are UV-blocking.
19 . The double-sided transparent conductive film of claim 17 wherein the first beam-blocking coating and the second beam-blocking coating are IR-blocking.
20 . The double-sided transparent conductive film of claim 12 wherein at least one of the first and the second substrate is IR-blocking or UV-blocking.
21 . A method for double-sided patterning comprising:
providing a double-sided transparent conductive film of claim 1 ;
laser patterning the first conductive layer with a first laser beam; and
laser patterning the second conductive layer with a second laser beam, wherein laser patterning comprises directing the first laser beam to predetermined regions of the first conductive layer, and the second laser beam to predetermined regions of the second conductive layer, thereby independently creating insulating regions in the first and second conductive layers.
22 . The method of claim 21 wherein laser patterning the first conductive layer and laser patterning the second conductive layer are carried out simultaneously.
23 . The method of claim 21 wherein laser patterning the first conductive layer and laser patterning the second conductive layer are carried out serially.
24 . The method of claim 21 wherein the beam-blocking substrate blocks 20-50% of the first laser beam energy or the second laser beam energy.