Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages
View Patent ↗This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.
1. A pulsed DC power supply system that provides pulsed DC power to a plurality of anodeless electrodes sustaining a plasma in a plasma processing chamber, the pulsed DC power supply system comprising:
a DC power supply coupled to and providing a first DC power to a first and second rail, such that a rail voltage exists across the first and second rails;
a switching circuit coupled to the first and second rails and receiving the first DC power via the first and second rails and converting the first DC power to a first pulsed DC voltage configured for delivery to at least a first anodeless electrode of the plasma processing chamber; and
a voltage-boosting circuit coupled between the first and second rails, the voltage-boosting circuit comprising:
a first diode coupled between the first rail and a first electrical node and forward biased when a voltage measured from the first rail to the first electrical node is sufficiently positive to forward bias the first diode;
a capacitive element coupled between the first electrical node and the second rail;
a switch selectively coupling the first electrical node and a second electrical node;
a second diode coupled between the second rail and the second electrical node and forward biased when a voltage measured from the second rail to the second electrical node is sufficiently positive to forward bias the second electrical node; and
an inductive element coupled between the second electrical node and the first rail.
2. The pulsed DC power supply system of claim 1 , wherein the capacitive element is charged via current passing through the first diode and is discharged through the switch and the inductive element.
3. The pulsed DC power supply system of claim 1 further comprising a third diode coupled between the first and second electrical nodes and forward biased when a voltage measured from the second electrical node to the first electrical node is sufficiently positive to forward bias the third diode.
4. The pulsed DC power supply system of claim 1 , wherein the switch is selected from the group consisting of: insulated-gate bipolar transistors (IGBTs), bipolar junction transistors, and field effect transistors.
5. The pulsed DC power supply system of claim 1 , wherein the voltage-boosting circuit is part of the DC power supply.
6. The pulsed DC power supply system of claim 1 , wherein the voltage-boosting circuit is part of the switching circuit.
7. A pulsed DC power supply system that provides pulsed DC power to a plurality of anodeless electrodes sustaining a plasma in a plasma processing chamber, the pulsed DC power supply system comprising:
a DC power supply coupled to and providing a first DC power to a first and second rail, such that a rail voltage exists across the first and second rails; and
a switching circuit coupled to the first and second rails and receiving the first DC power via the first and second rails and converting the first DC power to a first pulsed DC voltage configured for delivery to at least a first anodeless electrode of the plasma processing chamber; and
a voltage-boosting circuit coupled between the first and second rails, the voltage-boosting circuit comprising:
a first diode coupled between the first rail and a first electrical node, an anode of the first diode being at a voltage of the first rail;
a capacitive element coupled between the first electrical node and the second rail;
a switch selectively coupling the first electrical node and a second electrical node;
a second diode coupled between the second rail and the second electrical node, an anode of the second diode being at a voltage of the second rail; and
an inductive element coupled between the second electrical node and the first rail.
8. The pulsed DC power supply system of claim 7 , wherein the capacitive element is charged via current passing through the first diode and is discharged through the switch and the inductive element.
9. The pulsed DC power supply system of claim 7 , further comprising a third diode coupled between the first and second electrical nodes, an anode of the third diode being at a voltage of the second electric node.
10. The pulsed DC power supply system of claim 7 , wherein the switch is selected from the group consisting of: insulated-gate bipolar transistors (IGBTs), bipolar junction transistors, and field effect transistors.
11. The pulsed DC power supply system of claim 7 , wherein the voltage-boosting circuit is part of the DC power supply.