Imaging device
An imaging device which is highly stable to irradiation with radiations such as X-rays and can inhibit a decrease in electrical characteristics is provided. The imaging device obtains an image using radiations such as X-rays and includes pixel circuits which are arranged in a matrix and which a scintillator overlaps. Each of the pixel circuits includes a switching transistor whose off-state current is extremely low and a light-receiving element. A shielding layer formed using a metal material and the like overlaps the transistor and the light-receiving element. With the structure, an imaging device which is highly stable to irradiation with radiations such as X-rays and can inhibit a decrease in electrical characteristics can be provided.
1. An imaging device comprising:
a pixel circuit including a light-receiving element and a circuit portion;
an insulating film over the pixel circuit;
a shielding layer over the insulating film; and
a scintillator over the shielding layer, configured to emit light in response to radiation from a radiation source,
wherein the circuit portion includes a first transistor electrically connected to the light-receiving element,
wherein the first transistor comprises a channel formation region which comprises an oxide semiconductor,
wherein the shielding layer and the pixel circuit overlap each other to prevent the pixel circuit from being exposed to the radiation,
wherein the shielding layer includes an opening,
wherein the opening and the circuit portion do not overlap each other,
wherein the light-receiving element senses light emitted from the scintillator passing through the opening and the insulating film, and
wherein the light-receiving element is included in the circuit portion.
2. The imaging device according to claim 1 , wherein the shielding layer is a single layer or a stacked layer including a material selected from lead, gold, platinum, iridium, osmium, rhenium, tungsten, tantalum, hafnium, palladium, rhodium, and ruthenium.
3. The imaging device according to claim 1 , wherein the light-receiving element comprises a transistor in which a channel formation region comprises an oxide semiconductor.
4. The imaging device according to claim 1 , wherein the light-receiving element comprises a photodiode.
5. The imaging device according to claim 1 , wherein the light-receiving element comprises a variable resistor in which a semiconductor layer is positioned between a pair of electrodes.
6. An imaging device comprising:
a pixel circuit including a light-receiving element and a circuit portion;
an insulating film over the pixel circuit;
a shielding layer over the insulating film; and
a scintillator over the shielding layer, configured to emit light in response to radiation from a radiation source,
wherein the circuit portion includes a first transistor electrically connected to the light-receiving element,
wherein the first transistor comprises a channel formation region which comprises an oxide semiconductor,
wherein the shielding layer and the pixel circuit overlap each other to prevent the pixel circuit from being exposed to the radiation,
wherein the shielding layer includes an opening,
wherein the opening and the circuit portion do not overlap each other,
wherein the light-receiving element senses light emitted from the scintillator passing through the opening and the insulating film,
wherein a material included in the scintillator has a higher refractive index than the insulating film, and
wherein the light-receiving element is included in the circuit portion.
7. The imaging device according to claim 6 , wherein a material having a higher refractive index than the insulating film is provided in the opening.
8. The imaging device according to claim 6 , wherein the shielding layer is a single layer or a stacked layer including a material selected from lead, gold, platinum, iridium, osmium, rhenium, tungsten, tantalum, hafnium, palladium, rhodium, and ruthenium.
9. The imaging device according to claim 6 , wherein the light-receiving element comprises a transistor in which a channel formation region comprises an oxide semiconductor.
10. The imaging device according to claim 6 , wherein the light-receiving element comprises a photodiode.
11. The imaging device according to claim 6 , wherein the light-receiving element comprises a variable resistor in which a semiconductor layer is positioned between a pair of electrodes.
12. The imaging device according to claim 1 ,
wherein the circuit portion includes a charge accumulation portion, the first transistor, a second transistor, and a third transistor,
wherein one of a source and a drain of the first transistor is electrically connected to the light-receiving element,
wherein the other of the source and the drain of the first transistor is electrically connected to the charge accumulation portion,
wherein a gate of the second transistor is electrically connected to the charge accumulation portion,
wherein one of a source and a drain of the second transistor is electrically connected to one of a source and a drain of the third transistor, and
wherein at least the first transistor includes a channel formation region comprising an oxide semiconductor.
13. The imaging device according to claim 1 ,
wherein the circuit portion includes a charge accumulation portion, the first transistor, a second transistor, a third transistor, and a fourth transistor,
wherein one of a source and a drain of the first transistor is electrically connected to the light-receiving element,
wherein the other of the source and the drain of the first transistor is electrically connected to the charge accumulation portion,
wherein a gate of the second transistor is electrically connected to the charge accumulation portion,
wherein one of a source and a drain of the second transistor is electrically connected to one of a source and a drain of the third transistor,
wherein one of a source and a drain of the fourth transistor is electrically connected to the charge accumulation portion, and
wherein at least the first transistor and the fourth transistor each include a channel formation region comprising an oxide semiconductor.
14. The imaging device according to claim 1 , wherein a material having a higher refractive index than the insulating film is provided in the opening.