Nitride semiconductor light emitting device
View Patent ↗A light emitting device includes a first layer of a first conductivity type, a second layer of a second conductivity type, a light emitting layer between the first and second layers, a first electrode disposed on a surface of the first layer, and a second electrode disposed on a surface of the second layer and electrically insulated from the first layer. The first layer has first and second regions, each of which contacts the first electrode. A dopant concentration in the first region is less than a dopant concentration in the second region.
1. A nitride semiconductor light emitting device, comprising:
a first layer having a first conductivity type;
a second layer having a second conductivity type;
a light emitting layer between the first layer and the second layer, the light emitting layer including a nitride semiconductor material;
a first electrode disposed on a surface of the first layer; and
a second electrode disposed on a first surface of the second layer and electrically insulated from the first layer, wherein
the first layer has a first region contacting the first electrode and having a first dopant concentration, and a second region contacting the first electrode and having a second dopant concentration that is greater than the first dopant concentration, and
a portion of the first electrode is between the second region and the second electrode in a direction parallel to the first surface.
2. The nitride semiconductor light emitting device according to claim 1 , wherein a second surface of the second layer has a phosphor layer disposed thereon, and the second surface of the second layer has surface irregularities.
3. The nitride semiconductor light emitting device of claim 2 , wherein a surface of the phosphor layer contacting the second surface of the second layer has surface irregularities.
4. The nitride semiconductor light emitting device of claim 1 , wherein the light emitting layer has a multi-quantum well structure including a plurality of pairs of well layers and barrier layers, and the barrier layers are doped with electron donors.
5. The nitride semiconductor light emitting device of claim 4 , wherein
the well layers are formed of In x Ga y Al 1-x-y N (where 0<x<1, 0<y<1, and 0<x+y≦1), and
the barrier layers are formed of In x Ga y Al 1-x-y N (where 0≦x<1, 0<y<1, and 0<x+y≦1).
6. The nitride semiconductor light emitting device of claim 1 , wherein the second region of the first layer is separated from a recess portion by the first electrode, the recess portion extending from the surface of the first layer through the light emitting layer and into the second layer.
7. A nitride semiconductor light emitting device, comprising:
a first layer having a first conductivity type;
a second layer having a second conductivity type;
a light emitting layer between the first layer and the second layer, the light emitting layer including a nitride semiconductor material;
a recess portion extending from a surface of the first layer through the light emitting layer and into the second layer in a first direction orthogonal to the surface of the first layer;
a first electrode disposed on the surface of the first layer; and
a second electrode disposed on a first surface of the second layer within the recess portion, wherein
the first layer has a first region contacting the first electrode and having a first dopant concentration, and a second region contacting the first electrode and having a second dopant concentration that is greater than the first dopant concentration, and
a portion of the first electrode is between the second region and the recess portion in a second direction perpendicular to the first direction.
8. The nitride semiconductor light emitting device according to claim 7 , wherein a second surface of the second layer has a phosphor layer disposed thereon, and the second surface of the second layer has surface irregularities.
9. The nitride semiconductor light emitting device of claim 8 , wherein a surface of the phosphor layer contacting the second surface of the second layer has surface irregularities.
10. The nitride semiconductor light emitting device of claim 9 , wherein the light emitting layer has a multi-quantum well structure including a plurality of pairs of well layers and barrier layers, and the barrier layers are doped with electron donors.
11. The nitride semiconductor light emitting device of claim 10 , wherein
the well layers are formed of In x Ga y Al 1-x-y N (where 0<x<1, 0<y<1, and 0<x+y≦1), and
the barrier layers are formed of In x Ga y Al 1-x-y N (where 0≦x<1, 0<y<1, and 0<x+y≦1).
12. The nitride semiconductor light emitting device of claim 7 , wherein the second region of the first layer is separated from the recess portion by the first electrode.
13. A nitride semiconductor light emitting device, comprising:
a first layer having a first conductivity type;
a second layer having a second conductivity type;
a light emitting layer between the first layer and the second layer, the light emitting layer including a nitride semiconductor material;
an insulating portion extending from a surface of the first layer through the light emitting layer and into the second layer in a first direction orthogonal to the surface of the first layer;
a first electrode disposed on the surface of the first layer; and
a second electrode embedded in the insulating portion and electrically contacting the second layer, wherein
the first layer has a first region contacting the first electrode and having a first dopant concentration, and a second region contacting the first electrode and having a second dopant concentration that is greater than the first dopant concentration, and
a portion of the first electrode is between the second region and the insulating portion in a second direction perpendicular to the first direction.
14. The nitride semiconductor light emitting device according to claim 13 , wherein a surface of the second layer has a phosphor layer disposed thereon, and the surface of the second layer has surface irregularities.
15. The nitride semiconductor light emitting device of claim 14 , wherein a surface of the phosphor layer contacting the surface of the second layer has surface irregularities.
16. The nitride semiconductor light emitting device of claim 13 , further comprising:
a first pillar-shaped electrode extending through the insulating film and electrically connected to the first electrode; and
a second pillar-shaped electrode extending through the insulating film and electrically connected to the second electrode.
17. The nitride semiconductor light emitting device of claim 16 , further comprising:
a reinforcing resin layer disposed on the insulating film and surrounding the first and second pillar-shaped electrodes.
18. The nitride semiconductor light emitting device of claim 13 , wherein the light emitting layer has a multi-quantum well structure including a plurality of pairs of well layers and barrier layers, and the barrier layers are doped with electron donors.
19. The nitride semiconductor light emitting device of claim 18 , wherein
the well layers are formed of In x Ga y Al 1-x-y N (where 0<x<1, 0<y<1, and 0<x+y≦1), and
the barrier layers are formed of In x Ga y Al 1-x-y N (where 0≦x<1, 0<y<1, and 0<x+y≦1).
20. The nitride semiconductor light emitting device of claim 13 , wherein the second region of the first layer is separated from the insulating portion by the first electrode.