Granted Patent B2

US 10,454,024 · App. 14/193,979 · Granted Oct 22, 2019

Abstract

Claims (87)

1. A memory cell, comprising:

a magnetic cell core comprising:

a magnetic region comprising a depleted magnetic material, the depleted magnetic material formed from a precursor magnetic material, the precursor magnetic material comprising a diffusible species and at least one other species, the depleted magnetic material comprising the at least one other species;

another magnetic region;

an intermediate oxide region between the magnetic region and the another magnetic region;

an amorphous region proximate to the magnetic region, the amorphous region comprising a first surface facing the magnetic region and a second surface opposite to the first surface, the amorphous region comprising an attracter material having a chemical affinity for the diffusible species that is higher than a chemical affinity of the at least one other species for the diffusible species, the amorphous region comprising both the attracter material and at least a portion of the diffusible species from the precursor magnetic material; and

another oxide region comprising a nonmagnetic oxide material, the nonmagnetic oxide material being in direct physical contact with the second surface of the amorphous region, the magnetic region located between the intermediate oxide region and the another oxide region.

2. The memory cell of claim 1 , wherein the precursor magnetic material, from which the depleted magnetic material is formed, comprises a cobalt iron boron (CoFeB) precursor material.

3. The memory cell of claim 1 , wherein the diffusible species comprises boron.

4. The memory cell of claim 1 , wherein the attracter material comprises an alloy of:

at least one of cobalt, iron, and nickel, and

another transition element.

5. The memory cell of claim 1 , wherein the attracter material comprises at least one of an iron-cobalt-tungsten (FeCoW) alloy and an iron-hafnium (FeHf) alloy.

6. The memory cell of claim 1 , wherein the amorphous region is between the magnetic region and the another oxide region.

7. The memory cell of claim 1 , wherein the magnetic region exhibits a switchable magnetic orientation.

8. The memory cell of claim 1 , further comprising another amorphous region of another attracter material, the another amorphous region being proximate to the another magnetic region.

9. The memory cell of claim 8 , wherein the another attracter material is internal to the another magnetic region.

10. The memory cell of claim 1 , wherein the magnetic region has a bcc (001) crystalline structure.

11. The memory cell of claim 1 , wherein the memory cell has a tunnel magnetoresistance of greater than 100%.

12. A method of forming a magnetic memory cell, comprising:

forming a structure comprising:

forming a magnetic material over a substrate;

forming a nonmagnetic oxide material over the magnetic material;

forming another magnetic material over the nonmagnetic oxide material; and

forming an amorphous attracter material and another nonmagnetic oxide material proximate to at least one of the magnetic material and the another magnetic material,

the at least one of the magnetic material and the another magnetic material comprising a diffusible species and at least one other species,

the amorphous attracter material having a chemical affinity for the diffusible species that is higher than a chemical affinity of the at least one other species for the diffusible species;

annealing at least a portion of the structure to transfer the diffusible species from the at least one of the magnetic material and the another magnetic material to the amorphous attracter material, to convert the at least one of the magnetic material and the another magnetic material to a depleted magnetic material, and to crystallize the depleted magnetic material without crystallizing the amorphous attracter material, the depleted magnetic material comprising the at least one other species; and

after annealing, patterning the structure to form a magnetic cell core comprising:

a magnetic region comprising the depleted magnetic material, the depleted magnetic material formed from one of the magnetic material and the another magnetic material;

another magnetic region formed from another of the magnetic material and the another magnetic material;

an intermediate oxide region comprising the nonmagnetic oxide material and disposed between the magnetic region and the another magnetic region;

an amorphous region proximate to the magnetic region, the amorphous region comprising a first surface facing the magnetic region and a second surface opposite to the first surface, the amorphous region comprising both the amorphous attracter material and at least a portion of the diffusible species from the at least one of the magnetic material and the another magnetic material; and

another oxide region comprising the another nonmagnetic oxide material, the another nonmagnetic oxide material being in direct physical contact with the second surface of the amorphous region, the magnetic region located between the intermediate oxide region and the another oxide region.

13. The method of claim 12 , wherein:

forming the amorphous attracter material precedes forming the magnetic material over the substrate; and

forming a magnetic material comprises forming the magnetic material over the substrate and over the amorphous attracter material.

14. The method of claim 13 , wherein forming an amorphous attracter material and another nonmagnetic oxide material comprises:

before forming the amorphous attracter material, forming the another nonmagnetic oxide material over the substrate; and

forming the amorphous attracter material over the another nonmagnetic oxide material.

15. The method of claim 12 , wherein the annealing precedes forming the another magnetic material over the nonmagnetic oxide material.

16. The method of claim 12 , wherein annealing comprising annealing at a temperature between about 300° C. and about 700° C.

17. The method of claim 12 , wherein annealing comprises annealing at a temperature of greater than 500° C.

18. The method of claim 12 , wherein forming an amorphous attracter material comprises sputtering a conductive alloy.

19. The method of claim 12 :

further comprising forming another amorphous attracter material proximate to the another of the magnetic material and the another magnetic material; and

wherein annealing comprises annealing at least the portion of the structure to transfer another diffusible species from the another of the magnetic material and the another magnetic material to the another amorphous attracter material, to convert the another of the magnetic material and the another magnetic material to another depleted magnetic material, and to crystallize both the depleted magnetic material and the another depleted magnetic material without crystallizing the amorphous attracter material and the another amorphous attracter material.

20. The method of claim 12 , wherein forming a nonmagnetic oxide material comprises:

forming a metal over a substrate; and

oxidizing the metal to form the nonmagnetic oxide material.

21. A memory device, comprising:

a spin torque transfer magnetic random access memory (STT-MRAM) array comprising:

STT-MRAM cells, at least one STT-MRAM cell of the STT-MRAM cells comprising:

a magnetic cell core comprising:

a magnetic region over a substrate, the magnetic region comprising a depleted magnetic material, the depleted magnetic material formed from a precursor magnetic material, the precursor magnetic material comprising a diffusible species and at least one other species, the depleted magnetic material comprising the at least one other species, the magnetic region being a free region of the at least one STT-MRAM cell;

another magnetic region, the another magnetic region being a fixed region of the at least one STT-MRAM cell;

an intermediate oxide region between the magnetic region and the another magnetic region;

an amorphous region proximate to the magnetic region, the amorphous region comprising a first surface facing the magnetic region and a second surface opposite to the first surface, the amorphous region comprising an attracter material having a chemical affinity for the diffusible species that is higher than a chemical affinity of the at least one other species for the diffusible species, the amorphous region comprising both the attracter material and at least a portion of the diffusible species from the precursor magnetic material; and

another oxide region comprising a nonmagnetic oxide material, the nonmagnetic oxide material being in direct physical contact with the second surface of the amorphous region, the magnetic region located between the intermediate oxide region and the another oxide region.

22. The memory device of claim 21 , wherein the another magnetic region overlays the magnetic region.

23. The memory device of claim 22 , wherein the another oxide region comprises a secondary oxide region underlying the magnetic region and the amorphous region.

24. The memory device of claim 21 , wherein the magnetic region overlays the another magnetic region.

25. The memory device of claim 24 , wherein the another oxide region comprises a secondary oxide region overlying the magnetic region and the amorphous region.

26. The memory device of claim 21 , wherein the amorphous region is physically isolated from the another magnetic region.

27. The memory device of claim 21 , wherein:

the magnetic region exhibits a crystalline structure and magnetism with a perpendicular magnetic orientation; and

the another magnetic region exhibits magnetism with the perpendicular magnetic orientation.

28. The memory device of claim 27 , wherein:

the diffusible species comprises boron; and

the attracter material is chemically bonded to the boron.

29. A memory device, comprising:

an array of magnetic memory cells, at least one magnetic memory cell of the array of magnetic memory cells comprising a magnetic cell core comprising:

at least two magnetic regions over a substrate, the at least two magnetic regions comprising:

a magnetic region comprising a depleted magnetic material, the depleted magnetic material formed from a precursor magnetic material, the precursor magnetic material comprising a diffusible species and at least one other species, the depleted magnetic material comprising the at least one other species; and

another magnetic region;

an amorphous region proximate to the magnetic region, the amorphous region comprising a first surface facing the magnetic region and a second surface opposite to the first surface, the amorphous region comprising:

an attracter material having a chemical affinity for the diffusible species that is higher than a chemical affinity of the at least one other species for the diffusible species, the attracter material comprising an alloy of:

 at least one transition element selected from the group consisting of cobalt, iron, and nickel; and

 at least one other transition element; and

at least a portion of the diffusible species from the precursor magnetic material; and

an intermediate oxide region between the magnetic region and the another magnetic region; and

another oxide region comprising a nonmagnetic oxide material, the nonmagnetic oxide material being in direct physical contact with the second surface of the amorphous region, the magnetic region located between the intermediate oxide region and the another oxide region.

30. The memory device of claim 29 , wherein:

the magnetic region has a crystalline structure; and

the attracter material is amorphous.

31. The memory cell of claim 1 , wherein the nonmagnetic oxide material of the another oxide region exhibits a bcc (001) crystalline structure and the amorphous region is disposed directly between the another oxide region and the magnetic region.

32. The memory cell of claim 5 , wherein the attracter material consists of the iron-cobalt-tungsten (FeCoW) alloy.

Assignments (8)