Diffraction based overlay metrology tool and method of diffraction based overlay metrology
Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together forming a composite grating. A first illumination beam is provided under an angle of incidence along a first horizontal direction. The intensity of a diffracted beam from the composite grating is measured. A second illumination beam is provided under the angle of incidence along a second horizontal direction. The second horizontal direction is opposite to the first horizontal direction. The intensity of the diffracted beam from the composite grating is measured. The difference between the diffracted beam from the first illumination beam and the diffracted beam from the second illumination beam, linearly scaled, results in the overlay error.
1. A method comprising:
illuminating a composite grating on a surface of a substrate under a normal angle of incidence, the composite grating comprising first and second superimposed gratings with similar pitch;
measuring, at an image plane, a first intensity of a first diffracted beam from the composite grating;
measuring a second intensity of a second diffracted beam from the composite grating at the image plane; and
determining, using an image detector, an overlay error between the first and second gratings based on the first and second measured intensities.
2. The method of claim 1 , further comprising:
determining an intensity difference between the first intensity and the second intensity, the intensity difference being proportional to the overlay error between the first grating and the second grating.
3. The method of claim 1 , wherein:
measuring the first intensity comprises using pattern recognition to detect an image of the composite grating obtained by a positive first order diffracted beam, and
measuring the second intensity comprises using pattern recognition to detect an image of the composite grating obtained by a negative first order diffracted beam.
4. The method of claim 3 , further comprising:
blocking diffraction orders other than the first diffraction order.
5. The method of claim 1 , wherein:
measuring the first intensity comprises using pattern recognition to detect an image of the composite grating obtained by a zero order diffracted beam, and
measuring the second intensity comprises using pattern recognition to detect an image of the composite grating obtained by a zero order diffracted beam.
6. The method of claim 1 , further comprising:
illuminating an additional composite grating on the substrate under a normal angle of incidence,
wherein:
the additional composite grating is formed by positioning a third grating and a fourth grating on top of the third grating, the third grating and the fourth grating having a substantially identical pitch as the first and the second grating,
the composite grating is biased with a first shift in a shift direction along a grating direction, and
the additional composite grating is biased with a second shift in the shift direction along the grating direction, the first shift being equal to but with opposite sign than the second shift.
7. The method of claim 6 , further comprising:
measuring, at the image plane, a third intensity of a third diffracted beam from the additional composite grating; and
measuring a fourth intensity of a fourth diffracted beam from the additional composite grating at the image plane.
8. A detection system comprising:
an illumination source configured to direct an illumination beam to diffract from a composite grating on a surface of a substrate under a normal angle of incidence, the composite grating comprising first and second superimposed gratings having a similar pitch;
an image detector configured to receive, at an image plane, a first diffracted beam and a second diffracted beam from the composite grating and measure their intensities;
a lens arranged along an optical path between the substrate position and the image detector; and
an aperture stop,
wherein the image detector is further configured to determine an overlay error between the first and second gratings based on the measured intensities of the first and second diffracted beams.
9. The detection system of claim 8 , wherein:
the first diffracted beam comprises a positive first order diffracted beam and the second diffracted beam comprises a negative first order diffracted beam, and
the image detector is configured to use pattern recognition to detect an image of the composite grating using the first order diffracted beam and the negative first order diffracted beam.
10. The detection system of claim 8 , wherein the image detector is configured to use pattern recognition to detect an image of the composite grating using only a zero order diffraction beam.
11. The detection system of claim 8 , wherein:
the lens comprises an objective lens adjacent to the surface of the substrate and a projection lens adjacent to the image detector,
the aperture stop is arranged along the optical path between the objective lens and the projection lens, and
the objective lens has a first numerical aperture value and the aperture stop has a second numerical aperture value, the second numerical aperture value being smaller than the first numerical aperture value.
12. The detection system of claim 8 , wherein the image detector is further configured to determine an intensity difference between the measured intensities of the first diffracted beam and the second diffracted beam, the intensity difference being proportional to the overlay error between the first grating and the second grating.
13. A lithographic apparatus comprising a detection system, comprising:
an illumination source configured to direct an illumination beam to diffract from a composite grating on a surface of a substrate under a normal angle of incidence, the composite grating comprising first and second superimposed gratings with similar pitch;
an image detector configured to receive, at an image plane, a first diffracted beam and a second diffracted beam from the composite grating and measure their intensities;
a lens arranged along an optical path between the substrate position and the image detector; and
an aperture stop,
wherein the image detector is further configured to determine an overlay error between the first and second gratings based on the measured intensities of the first and second diffracted beams.
14. The lithographic apparatus according to claim 13 , further comprising:
an illumination system configured to condition a beam of radiation;
a patterning device support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation;
a substrate table configured to hold the substrate; and
a projection system configured to project the patterned beam of radiation onto the substrate.
15. The lithographic apparatus according to claim 13 , wherein:
the first diffracted beam comprises a first order diffracted beam and the second diffracted beam comprises a negative first order diffracted beam, and
the image detector is configured to detect an image of the composite grating using the first order diffracted beam and the negative first order diffracted beam by a pattern recognition method.
16. The lithographic apparatus according to claim 15 , wherein the aperture stop is configured to block beams of diffraction order other than the first diffraction order and the negative first diffraction order.
17. The lithographic apparatus according to claim 13 , wherein the image detector is configured to detect an image of the composite grating using only a zero order diffraction beam by a pattern recognition method.
18. The lithographic apparatus according to claim 13 , wherein:
the lens comprises an objective lens adjacent to the surface of the substrate and a projection lens adjacent to the image detector,
the aperture stop is arranged along the optical path between the objective lens and the projection lens, and
the objective lens has a first numerical aperture value and the aperture stop has a second numerical aperture value, the second numerical aperture value being smaller than the first numerical aperture value.
19. The lithographic apparatus according to claim 13 , wherein the image detector is further configured to:
determine an intensity difference between the measured intensities of the first diffracted beam and the second diffracted beam, the intensity difference being proportional to the overlay error between the first grating and the second grating.