Optical imaging writer system
System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system comprises a plurality of spatial light modulator (SLM) imaging units, and a controller configured to control the plurality of SLM imaging units. Each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The controller synchronizes movements of the plurality of SLM imaging units with movement of a substrate in writing a mask data to the substrate in a lithography manufacturing process.
1. A parallel imaging writer system, comprising:
a plurality of spatial light modulator (SLM) imaging units,
wherein each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens, a first camera sensor configured to observe defocus of a substrate on-the-fly, a first motor, a first refractive disk, and a first optical path difference (OPD) modifier, wherein the first camera sensor, the first motor, the first refractive disk, and the first OPD modifier are configured to adjust focus of the first camera sensor to the substrate on-the-fly; and
a controller configured to control the plurality of SLM imaging units, and the controller synchronizes movements of the plurality of SLM imaging units with movement of the substrate in writing a mask data to the substrate in a lithography manufacturing process.
2. The parallel imaging writer system of claim 1 , wherein each SLM imaging unit further comprises:
a second camera sensor, wherein the first and second camera sensors are configured to observe the substrate with complementary focus offsets to determine direction of a target focus.
3. The parallel imaging writer system of claim 2 , wherein each SLM imaging unit further comprises:
a third OPD modifier, wherein the third OPD modifier is configured to adjust focus of the SLM imaging unit to the substrate on-the-fly without changing distance between the one or more projection lenses and the substrate.