Charged particle beam apparatus and sample processing method using charged particle beam apparatus
View Patent ↗A charged particle beam apparatus includes a sample stage, a focused ion beam column, a scattered electron detector that detects backscattered electrons generated from a cross-section of a sample, a crystal orientation information generation unit that generates crystal orientation information on a predetermined region of the cross-section, and an angle calculation unit that calculates attachment angles of the sample stage, corresponding to a direction of the cross-section. In response to receiving input of information indicating that the crystal orientation information on the region displayed on a display unit is changed to aimed second crystal orientation information, the angle calculation unit calculates the attachment angles corresponding to the direction of the cross-section for generating the second crystal orientation information, and the focused ion beam column performs etching processing on the cross-section at the calculated attachment angles.
1. A charged particle beam apparatus comprising:
an electron beam column configured to perform irradiation with electron beams;
a sample stage configured to support a sample;
a focused ion beam column configured to irradiate the sample with focused ion beams so as to form a cross-section;
a scattered electron detector configured to detect backscattered electrons which are generated from the cross-section by the irradiation with the electron beams;
a crystal orientation information generation unit configured to generate crystal orientation information on a predetermined region of the cross-section on the basis of the backscattered electrons;
an angle calculation unit configured to calculate attachment angles of the sample stage, corresponding to a direction of the cross-section; and
a display unit configured to display the crystal orientation information,
wherein in response to receiving input of information indicating that the crystal orientation information on the region displayed on the display unit is changed to aimed second crystal orientation information,
the angle calculation unit is configured to calculate the attachment angles corresponding to the direction of the cross-section for generating the second crystal orientation information, and
the focused ion beam column is configured to irradiate the sample with focused ion beams at the calculated attachment angles so that the cross-section is subject to etching processing.
2. The charged particle beam apparatus according to claim 1 , wherein the focused ion beams intersect the electron beams substantially perpendicularly.
3. The charged particle beam apparatus according to claim 1 ,
wherein the focused ion beams intersect the electron beams at an intersection angle φ, where 0<φ<90 degrees, and
wherein the angle calculation unit is configured to calculate the attachment angles further on the basis of the intersection angle φ.
4. The charged particle beam apparatus according to claim 1 , wherein the sample stage has a rotation axis which is substantially parallel to the focused ion beams.
5. A sample processing method using a charged particle beam apparatus, the method comprising:
detecting backscattered electrons which are generated from a cross-section of a sample by irradiation with electron beams;
generating crystal orientation information on a predetermined region of the cross-section on the basis of the backscattered electrons;
calculating attachment angles of a sample stage supporting the sample, corresponding to a direction of the cross-section; and
displaying the crystal orientation information, wherein in response to receiving input of information indicating that the crystal orientation information on the region is changed to aimed second crystal orientation information,
the calculating comprises calculating the attachment angles corresponding to the direction of the cross-section for generating the second crystal orientation information, and
the method further comprises irradiating the sample with focused ion beams at the calculated attachment angles so that the cross-section is subject to etching processing.
6. A non-transitory computer-readable medium having a computer program for sample processing using a charged particle beam apparatus stored thereon and readable by a computer, the computer program, when executed by the computer, causes the computer to perform operations comprising:
detecting backscattered electrons which are generated from a cross-section of a sample by irradiation with electron beams;
generating crystal orientation information on a predetermined region of the cross-section on the basis of the backscattered electrons;
calculating attachment angles of a sample stage supporting the sample, corresponding to a direction of the cross-section; and
displaying the crystal orientation information,
wherein in response to receiving input of information indicating that the crystal orientation information on the region is changed to aimed second crystal orientation information,
the calculating comprises calculating the attachment angles corresponding to the direction of the cross-section for generating the second crystal orientation information, and
the operations further comprise irradiating the sample with focused ion beams at the calculated attachment angles so that the cross-section is subject to etching processing.