IP Library › Granted Patent US 9,520,223
Granted Patent B2
US 9,520,223 · App. 14/223,567 · Granted Dec 13, 2016

Inductor and method for manufacturing the same

Inventors: Young Seuck Yoo (Suwon-si, KR); Kang Heon Hur (Suwon-si, KR); Jin Hyuck Yang (Suwon-si, KR); Sung Kwon Wi (Suwon-si, KR); Jong Yun Lee (Suwon-si, KR); Young Do Kweon (Suwon-si, KR)
Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
H01F27/2804H01F27/022H01F27/255H01F41/046H01F27/292H01F2027/2809Y10T29/4902
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Quick Facts
Patent No.
US 9,520,223
App. No.
14/223,567
Granted
Dec 13, 2016
Kind
B2
Abstract

The present invention relates to an inductor. An inductor in accordance with an embodiment of the present invention includes: an insulating layer having a hole; a conductive pattern disposed on both surfaces of the insulating layer and having a structure in which portions disposed on the both surfaces are electrically connected to each other through the hole; and a magnetic layer disposed on the insulating layer to cover the conductive pattern, wherein the conductive pattern has a plating pattern formed by performing a plating process.

Claims (14)

1. An inductor comprising:

an insulating layer having a hole;

a conductive pattern disposed on both surfaces of the insulating layer and having a structure in which portions disposed on the both surfaces are electrically connected to each other through the hole; and

a magnetic layer disposed on the insulating layer to cover the conductive pattern, wherein the conductive pattern comprises a first conductive pattern having a conducting portion formed in the hole and disposed on one surface of the insulating layer; and a second conductive pattern disposed on the other surface of the insulating layer and electrically connected to the first conductive pattern through the hole, and wherein a seed layer is only disposed between one surface of the insulating layer and an upper side of the first conductive pattern, wherein the second conductive pattern is a metal plate having an opening pattern, and wherein the metal plate is in direct contact with the surface of the insulating layer without any seed layer.

2. The inductor according to claim 1 ,

wherein the first conductive pattern is a plating pattern.

3. The inductor according to claim 1 , wherein the conductive pattern has a metal pattern formed by etching a metal plate.

4. The inductor according to claim 1 ,

wherein the second conductive pattern is a metal pattern formed by etching a metal plate.

5. The inductor according to claim 1 , wherein the insulating layer has a thickness of less than 40 μm.

6. The inductor according to claim 1 , wherein the conductive pattern comprises a first conductive pattern having a conducting portion formed in the hole and disposed on one surface of the insulating layer, wherein the thickness of the first conductive pattern is more than 2.5 times the thickness of the insulating layer.

7. The inductor according to claim 1 , wherein the conductive patterns disposed on both sides of the insulating layer based on the insulating layer have the same thickness.

8. The inductor according to claim 1 , wherein the magnetic layer is made of a metal-resin composite comprising an iron (Fe)-containing metal and a thermosetting resin.

9. The inductor according to claim 1 , wherein the conductive pattern has a multilayer coil structure disposed on both sides of the insulating layer with the insulating layer interposed therebetween.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 24, 2014
From: YOO, YOUNG SEUCK; HUR, KANG HEON; YANG, JIN HYUCK; WI, SUNG KWON; LEE, JONG YUN; KWEON, YOUNG DO
To: SAMSUNG ELECTRO-MECHANICS CO., LTD.
Reel/Frame 032510/0209 →
Priority Claims (1)
KR 10-2013-0031565 · Mar 25, 2013 · national
Continuity (1)
Related Publication 20140285305A1 · Sep 25, 2014