IP Library Granted Patent US 9,063,417
Granted Patent B2
US 9,063,417 · App. 14/227,482 · Granted Jun 23, 2015

High resolution, solvent resistant, thin elastomeric printing plates

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Quick Facts
Patent No.
US 9,063,417
App. No.
14/227,482
Granted
Jun 23, 2015
Kind
B2
Abstract

The present invention relates a printing element comprising at least one polymer layer which has photoimageable constituents and additions to make the polymer layer either hydrophobic or hydrophilic. The printing element may have two polymer layers on a substrate in which one of the layers comprises fluorinated acrylates or methacrylates.

Claims (51)

1. An article comprising:

a) a substrate

b) a first polymer layer disposed on the substrate wherein the first polymer layer comprises:

i) an elastomeric polymer; and

ii) an initiator; and

c) a second polymer layer disposed on the first polymer layer wherein the second polymer layer comprises:

i) an elastomeric polymer; and

ii) a photoinitiator; and

wherein the first polymer layer or the second polymer layer further comprises monomers selected from the group consisting of:

and mixtures thereof; and

wherein the polymer layer that does not contain the monomers contains non-fluorinated acrylate or methacrylate monomers.

2. The article of claim 1 wherein the elastomeric polymer in the first polymer layer and the second polymer layer is a block copolymer of styrene-butadiene-styrene or styrene-isoprene-styrene.

3. The article of claim 1 wherein the first polymer layer and the second polymer layer are crosslinkable and have an elastic modulus in the range of 10 to 100 MPa upon crosslinking.

4. The article of claim 1 wherein the article is a precursor for a printing element.

5. The article of claim 4 wherein the article is a flexographic printing form precursor.

6. The article of claim 4 wherein the article is a gravure printing form precursor.

7. The article of claim 1 wherein second polymer layer is a layer capable of forming a relief pattern thereon.

8. The article of claim 7 wherein the second polymer layer is capable of forming a relief pattern thereon that comprises at least one relief feature having a relief height (Δh)-to-feature size ratio of from about 1:1 to 1:5.

9. The article of claim 1 wherein the polymer layer that does not contain the monomers selected from monomers of formulas (I)-(IV) is hydrophilic, and the other polymer layer is hydrophobic.

10. A process comprising:

a) providing a substrate;

b) depositing a first polymer layer on the substrate, the first polymer layer comprising:

i) an elastomeric polymer;

ii) an initiator; and

ii non-fluorinated acrylate or methacrylate monomers;

c) crosslinking the first polymer layer;

d) depositing a second polymer layer on the first polymer layer, the second polymer layer comprising:

i) an elastomeric polymer;

ii) a photoinitiator; and

iii) monomers selected from the group consisting of:

and mixtures thereof;

e) imaging a pattern on the second polymer layer forming an imaged pattern; and

f) developing the imaged pattern.

11. The process of claim 10 wherein the elastomeric polymer in the first polymer layer and the second polymer layer is a block copolymer of styrene-butadiene-styrene or styrene-isoprene-styrene.

12. The process of claim 10 wherein the first polymer layer and the second polymer layer have an elastic modulus in the range of 10 to 100 MPa.

13. A process comprising:

a) providing a substrate;

b) depositing a first polymer layer on the substrate wherein the first polymer layer comprises:

i) an elastomeric polymer;

ii) an initiator;

iii) monomers selected from the group consisting of:

and mixtures thereof;

c) crosslinking the first polymer layer;

d) depositing a second polymer layer on the first polymer layer wherein the second polymer layer comprises:

i) an elastomeric polymer;

ii) a photoinitiator; and

iii) monomers selected from non-fluorinated acrylate or methacrylate;

e) imaging a pattern on the second polymer layer forming an imaged pattern; and

f) developing the imaged pattern.

14. The process of claim 13 wherein the elastomeric polymer in the first polymer layer and the second polymer layer is a block copolymer of styrene-butadiene-styrene or styrene-isoprene-styrene.

15. The process of claim 13 wherein the first polymer layer and the second polymer layer have an elastic modulus in the range of 10 to 100 MPa.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 25, 2019
From: E. I. DU PONT DE NEMOURS AND COMPANY
To: DUPONT ELECTRONICS, INC.
Reel/Frame 049583/0269 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 15, 2014
From: BLANCHET, GRACIELA BEATRIZ; JAYCOX, GARY DELMAR; TASSI, NANCY G.
To: E. I. DUPONT DE NEMOURS AND COMPANY
Reel/Frame 032896/0528 →