IP Library Granted Patent US 9,452,492
Granted Patent B2
US 9,452,492 · App. 14/242,390 · Granted Sep 27, 2016

Systems and methods for forming apertures in microfeature workpieces

Inventors: Charles M. Watkins (Eagle, ID); William M. Hiatt (Eagle, ID)
Assignee: Micron Technology, Inc.
B23K26/03B23K26/0342B23K26/362B23K26/38B23K26/382B23K26/40H01L21/486H01L21/76898H05K3/0026B23K2203/50H05K2203/163Y10T29/49165
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Quick Facts
Patent No.
US 9,452,492
App. No.
14/242,390
Granted
Sep 27, 2016
Kind
B2
Abstract

Systems and methods for forming apertures in microfeature workpieces are disclosed herein. In one embodiment, a method includes directing a laser beam toward a microfeature workpiece to form an aperture and sensing the laser beam pass through the microfeature workpiece in real time. The method can further include determining a number of pulses of the laser beam and/or an elapsed time to form the aperture and controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form a second aperture in the microfeature workpiece.

Claims (17)

1. A method for forming an aperture in a microfeature workpiece, the method comprising:

positioning the microfeature workpiece between a laser and an electromagnetic radiation sensor;

directing a laser beam from the laser toward the microfeature workpiece to form a first hole in the microfeature workpiece while the microfeature workpiece is positioned between the laser and the electromagnetic radiation sensor;

determining a number of pulses of the laser beam and/or an elapsed time to form the first hole by sensing when the laser beam passes through the microfeature workpiece with the sensor;

determining a desired depth for a second hole in the microfeature workpiece; and

automatically controlling the laser beam to form a plurality of second holes based on the determined number of pulses and/or the determined elapsed time, a depth of the first hole, and the desired depth of the second hole.

2. The method of claim 1 wherein the first hole is a test aperture and the second hole is a production aperture, and wherein the method further comprises forming a plurality of production apertures by controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form the test aperture.

3. The method of claim 1 wherein:

the microfeature workpiece includes a first surface and a second surface opposite the first surface; and

the method further comprises supporting the microfeature workpiece with a workpiece carrier so that a center region of the first surface and a center region of the second surface do not contact the workpiece carrier while directing the laser beam.

4. The method of 1 wherein the first hole is a through aperture and the second hole is a bling aperture, and wherein the method further comprises:

determining a number of pulses of the laser beam and/or an elapsed time to form the through aperture; and

controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form a plurality of blind apertures in the microfeature workpiece.

5. The method of claim 1 wherein the first hole is a test through aperture and the second hole a production through aperture, and wherein the method further comprises:

determining a number of pulses of the laser beam and/or an elapsed time to form the test through aperture; and

controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form a plurality of production through apertures in the microfeature workpiece.

6. The method of claim 1 , further comprising supporting the microfeature workpiece by engaging a perimeter edge of the workpiece with a workpiece carrier.

Assignments (7)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
Continuity (4)
Division 14029105 · Sep 17, 2013
Division 11413289 · Apr 28, 2006
Division 10839457 · May 5, 2004
Related Publication 20140209582A1 · Jul 31, 2014