Semiconductor device and method of manufacturing semiconductor device
A semiconductor device including: a base material portion that includes a semiconductor substrate and an insulating film that is formed on one face of the semiconductor substrate and on which a vertical hole is formed along the thickness direction of the semiconductor substrate; a vertical hole wiring portion that includes a vertical hole electrode formed on a side wall of the base material portion that forms the vertical hole; a metallic film that is formed within the insulating film and that is electrically connected to the vertical hole wiring portion; and a conductive protective film that is formed to be in contact with the metallic film within the insulating film and that is formed in a region that includes a contact region of a probe during a probe test that is performed in the middle of manufacture on a film face of the metallic film.
1. A semiconductor device comprising:
a base material portion that includes a semiconductor substrate and an insulating film that is formed on one face of the semiconductor substrate and on which a hole is formed along a thickness direction of the semiconductor substrate;
a hole wiring portion that includes a hole electrode formed on a side wall of the base material portion that forms the hole;
a metallic film that is formed within the insulating film and that is electrically connected to the hole wiring portion;
a conductive protective film that is arranged at a position that opposes an opening portion of the hole and formed to be in physical contact with the metallic film within the insulating film, wherein the metallic film is provided on the semiconductor substrate side of the conductive protective film; and
a glass sealing material and a glass substrate sequentially disposed on at least one of the metallic film and the conductive protective film.
2. The semiconductor device according to claim 1 ,
wherein the conductive protective film is provided on a semiconductor substrate side of the metallic film.
3. The semiconductor device according to claim 1 , wherein an opening portion with a smaller opening area than a region that includes a contact region of a probe in which the conductive protective film is formed is formed on a surface of the insulating film on a contact side of the probe.
4. The semiconductor device according to claim 1 , wherein the conductive protective film comprises any one of an Au film, an Ni film, and a Cu film.
5. The semiconductor device according to claim 1 , wherein the conductive protective film comprises at least one of a W film, a Ti film, a laminated film of a TiN film and a Ti film, and a laminated film of a TaN film and a Ta film.