Exposure apparatus and method of manufacturing article
The present invention provides an exposure apparatus which exposes a substrate, comprising a substrate stage configured to be movable while holding the substrate, a measurement unit configured to measure a height of the substrate by irradiating the substrate with light and detecting the light reflected by the substrate, and a control unit configured to control the measurement unit, wherein the control unit obtains a velocity profile of the substrate stage and decides, based on the velocity profile, a plurality of timings to perform measurement by the measurement unit to equally space a plurality of measurement portions on the substrate measured by the measurement unit in a state in which an acceleration of the substrate stage is nonzero.
1. An exposure apparatus which exposes a substrate, comprising:
a substrate stage configured to be movable while holding the substrate;
a measurement unit configured to measure a height of the substrate by irradiating the substrate with light and detecting the light reflected by the substrate; and
a control unit configured to control the measurement unit,
wherein the control unit obtains a velocity profile of the substrate stage and decides, based on the velocity profile, a plurality of timings to perform measurement by the measurement unit to equally space a plurality of measurement portions on the substrate measured by the measurement unit in a state in which an acceleration of the substrate stage is nonzero.
2. The apparatus according to claim 1 , wherein
the measurement unit performs measurement in a period at each of the plurality of timings to give a range to each of the plurality of measurement portions, and
the control unit decides the period at each of the plurality of timings based on the velocity profile to set, to be a target value, a length of the range of each of the plurality of measurement portions in a moving direction of the substrate stage.
3. The apparatus according to claim 2 , wherein the measurement unit sets, as a measurement result at one measurement portion, an average value of a height at the one measurement portion.
4. The apparatus according to claim 2 , wherein the control unit changes, in accordance with the decided period, an intensity of light irradiating the range by the measurement unit so that an irradiating dose of light irradiating the range by the measurement unit falls within an allowable range.
5. The apparatus according to claim 1 , wherein
the measurement unit measures a height of a region of the substrate irradiated with light for exposing the substrate, prior to the irradiation in a state in which the substrate moves according to the velocity profile, and
the control unit decides the plurality of timings based on the velocity profile when exposing the substrate.
6. The apparatus according to claim 1 , further comprising a detection unit configured to detect an alignment mark formed on the substrate,
wherein the control unit decides the plurality of timings based on the velocity profile when the detection unit detects the alignment mark.
7. The apparatus according to claim 1 , further comprising a position measurement unit configured to measure a position of the substrate stage,
wherein the control unit obtains the velocity profile by using a measurement result of the position measurement unit.
8. A method of manufacturing an article, the method comprising:
exposing a substrate using an exposure apparatus;
developing the exposed substrate; and
processing the developed substrate to manufacture the article,
wherein the exposure apparatus, which exposes the substrate, includes:
a substrate stage configured to be movable while holding the substrate;
a measurement unit configured to measure a height of the substrate by irradiating the substrate with light and detecting the light reflected by the substrate; and
a control unit configured to control the measurement unit,
wherein the control unit obtains a velocity profile of the substrate stage and decides, based on the velocity profile, a plurality of timings to perform measurement by the measurement unit to equally space a plurality of measurement portions on the substrate measured by the measurement unit in a state in which an acceleration of the substrate stage is nonzero.
9. An exposure apparatus which exposes a substrate, comprising:
a substrate stage configured to be movable while holding the substrate;
a measurement unit configured to measure a height of the substrate by irradiating the substrate with light and detecting the light reflected by the substrate; and
a control unit configured to control the measurement unit,
wherein the control unit performs measurement by the measurement unit in a state in which an acceleration of the substrate stage is nonzero, and wherein the control unit obtains a velocity profile of the substrate stage and decides, based on the velocity profile, a plurality of timings to perform the measurement by the measurement unit so that a interval of the plurality of timings in a state in which velocity of the substrate stage is high becomes shorter than the interval of the plurality of timings in a state in which the velocity of the substrate stage is low.