Microelectronic workpiece processing systems and associated methods of color correction
View Patent ↗Several embodiments of semiconductor systems and associated methods of color corrections are disclosed herein. In one embodiment, a method for producing a light emitting diode (LED) includes forming an (LED) on a substrate, measuring a base emission characteristic of the formed LED, and selecting a phosphor based on the measured base emission characteristic of the formed LED such that a combined emission from the LED and the phosphor at least approximates white light. The method further includes introducing the selected phosphor onto the LED via, for example, inkjet printing.
1. A system for processing a semiconductor substrate, comprising:
a substrate support configured to individually carry a microelectronic workpiece containing a plurality of light emitting diodes (LEDs);
a container holding a phosphor;
an injector operatively coupled to the container, the injector being configured to introduce a volume of the phosphor onto the plurality of LEDs of the microelectronic workpiece; and
a controller operatively coupled to the injector, the controller having a computer-readable storage medium containing instructions which, when executed, cause the controller to perform a method comprising:
receiving a base emission characteristic of the plurality of LEDs of the microelectronic workpiece;
adjusting a characteristic of the phosphor based on a previously-performed measurement that generates a plurality of points in a chromaticity plot of the received base emission characteristic of the plurality of LEDs, and wherein each of the plurality of points is indicative of a set of parameters associated with the phosphor and the plurality of LEDs, and wherein the plurality of points together define a rectangular distribution area; and
introducing the phosphor with the adjusted characteristic onto the plurality of LEDs.
2. The system of claim 1 , further comprising a probe configured to measure the base emission characteristic of the plurality of LEDs of the microelectronic workpiece.
3. The system of claim 1 , further comprising a probe configured to measure the base emission characteristic of the plurality of LEDs of the microelectronic workpiece, wherein the method further includes:
organizing and storing the measured emission characteristic of the plurality of LEDs in an emission map; and
receiving a base emission characteristic includes receiving an emission characteristic from the emission map.
4. The system of claim 1 wherein:
receiving a base emission characteristic includes receiving an emission characteristic from an emission map stored in the computer-readable storage medium of the controller; and
adjusting the characteristic of the phosphor includes determining at least one of a composition and a concentration from a recipe database based on the received emission characteristic of the plurality of LEDs.
5. The system of claim 1 wherein:
receiving a base emission characteristic includes receiving an emission characteristic from an emission map stored in the computer-readable storage medium of the controller; and
adjusting the characteristic of the phosphor includes determining (1) at least one of a composition and a concentration of a first phosphor and a second phosphor; and (2) a ratio of the first and second phosphors from a recipe database based on the received emission characteristic of the plurality of LEDs.
6. The system of claim 1 , wherein the method further comprises adjusting the characteristic of the phosphor based on a target emission.
7. The system of claim 1 , wherein the container is a first container and the phosphor is a first phosphor, and wherein the system further comprises a second container holding a second phosphor.
8. The system of claim 7 , wherein the method further comprises introducing the first phosphor and the second phosphor, in a ratio, with the adjusted characteristic onto the plurality of LEDs.
9. The system of claim 8 , wherein the ratio includes at least one of a mass ratio, a molar ratio, and a volume ratio.
10. The system of claim 1 , wherein the base emission characteristic is measured based on an emission wavelength of the plurality of LEDs with a peak intensity.
11. A system for processing a semiconductor substrate, comprising:
a substrate support configured to individually carry a microelectronic workpiece containing a plurality of light emitting diodes (LEDs);
a container holding a phosphor;
an injector operatively coupled to the container, the injector being configured to introduce a volume of the phosphor onto the plurality of LEDs of the microelectronic workpiece; and
a controller operatively coupled to the injector, the controller having a computer-readable storage medium containing instructions which, when executed, cause the controller to perform a method comprising:
receiving a base emission characteristic of the plurality of LEDs of the microelectronic workpiece;
developing a compensation scheme by selecting a group of candidate phosphors based on the base emission characteristic of the plurality of LEDs, wherein the group of the candidate phosphors is selected based on a previously-performed measurement that generates a plurality of points in a chromaticity plot of the received base emission characteristic of the plurality of LEDs, and wherein each of the plurality of points is indicative of a set of parameters associated with the phosphor and the plurality of LEDs, and wherein the plurality of points together define a rectangular distribution area;
adjusting a characteristic of the phosphor based on the compensation scheme; and
introducing the phosphor with the adjusted characteristic onto the plurality of LEDs.
12. The system of claim 11 , further comprising a probe configured to measure the base emission characteristic of the plurality of LEDs of the microelectronic workpiece.
13. The system of claim 11 , further comprising a probe configured to measure the base emission characteristic of the plurality of LEDs of the microelectronic workpiece, wherein the method further includes:
organizing and storing the measured emission characteristic of the plurality of LEDs in an emission map; and
receiving a base emission characteristic includes receiving an emission characteristic from the emission map.
14. The system of claim 11 wherein:
receiving a base emission characteristic includes receiving an emission characteristic from an emission map stored in the computer-readable storage medium of the controller; and
adjusting the characteristic of the phosphor includes determining at least one of a composition and a concentration from a recipe database based on the received emission characteristic of the plurality of LEDs.
15. The system of claim 11 wherein:
receiving a base emission characteristic includes receiving an emission characteristic from an emission map stored in the computer-readable storage medium of the controller; and
adjusting the characteristic of the phosphor includes determining (1) at least one of a composition and a concentration of a first phosphor and a second phosphor; and (2) a ratio of the first and second phosphors from a recipe database based on the received emission characteristic of the plurality of LEDs.