Semiconductor device including dummy pattern
View Patent ↗A semiconductor device includes a substrate including a circuit region, a dummy region, and a dummy clearance section surrounding the circuit region, and a plurality of dummy patterns formed in the dummy region, the plurality of dummy patterns comprising a first dummy pattern and a second dummy pattern, a distance between the first dummy pattern and the circuit region being less than a distance between the second dummy pattern and the circuit region, and a dummy pattern being absent between the first dummy pattern and the circuit region. The first dummy pattern includes an area which is greater than an area of the second dummy pattern.
1. A semiconductor device comprising:
a substrate comprising a circuit region, a dummy region, and a dummy clearance section surrounding the circuit region; and
a plurality of dummy patterns formed in the dummy region, the plurality of dummy patterns comprising a first dummy pattern and a second dummy pattern, the first dummy pattern being adjacent the dummy clearance section, the second dummy pattern being adjacent the first dummy pattern, the first dummy pattern being placed between the second dummy pattern and the circuit region such that a distance between the first dummy pattern and the circuit region is less than a distance between the second dummy pattern and the circuit region, and a dummy pattern being absent between the first dummy pattern and the circuit region,
wherein the first dummy pattern comprises an area which is greater than an area of the second dummy pattern.
2. The semiconductor device according to claim 1 , wherein the first dummy pattern and the second dummy pattern comprise a rectangular shape.
3. The semiconductor device according to claim 1 , wherein the circuit region and the dummy clearance section comprise a polygonal shape.
4. The semiconductor device according to claim 1 , wherein the plurality of dummy patterns excluding the first and the third dummy patterns are arranged in a row at a first pitch extending in a first direction, and the row is arranged repeatedly at a second pitch in a second direction.
5. The semiconductor device according to claim 1 , wherein the first dummy pattern comprises a polygonal shape.
6. A semiconductor device comprising:
a substrate comprising a circuit region, a dummy region and a dummy clearance section surrounding the circuit region, wherein the dummy region comprises a first edge adjacent the dummy clearance section and a second edge distant from the dummy clearance section;
a plurality of a first dummy patterns formed in the dummy region, the plurality of first dummy patterns being disposed along the first edge of the dummy region, and
a plurality of a second dummy patterns formed in the dummy region, the plurality of second dummy patterns being disposed along the second edge of the dummy region,
wherein a first dummy pattern of the plurality of first dummy patterns comprises an area which is greater than an area of a second dummy pattern of the plurality of second dummy patterns.
7. The semiconductor device according to claim 6 , wherein the first dummy pattern and the second dummy pattern comprise a rectangular shape.
8. The semiconductor device according to claim 6 , wherein the circuit region and the dummy clearance section comprise a polygonal shape.
9. The semiconductor device according to claim 6 , wherein the plurality of the second dummy are arranged in a row at a first pitch extending in a first direction, and the row is arranged repeatedly at a second pitch in a second direction.
10. The semiconductor device according to claim 6 , wherein the first dummy pattern comprises a polygonal shape.