METHOD FOR A DRY EXHUMATION WITHOUT OXIDATION OF A CELL AND SOURCE LINE
Various embodiments of the present invention are directed to a method for fabricating a memory cell comprising performing a passivation step on a cell structure and cell source lines prior to exhuming a masking layer to prevent oxidation of the cell structure and source lines.
1 . A method for fabricating a memory cell comprising:
performing a passivation step on a cell structure and a source line prior to exhuming a masking layer to prevent oxidation of the cell structure and the source line.
2 . The method of claim 1 , wherein the passivation step comprises:
forming a protective film on the cell structure and the source line using a compound which passivates a metal layer of the cell structure and the source line, wherein the protective film is formed from the reaction of the compound with the metal layer; and
exhuming the masking layer.
3 . The method of claim 2 , wherein the compound is a fluorine-based compound.
4 . The method of claim 3 , wherein the metal layer is copper.
5 . The method of claim 4 , wherein the fluorine based compound is one of CF4, SF6, NF3, CHF3, and CH2F2.
6 . The method of claim 1 , wherein the masking layer is one of carbon layer or an under layer (UL).
7 . The method of claim 1 , further comprising:
performing, as the passivation step in high aspect ratio contact etching, an etching of the masking layer, oxide/nitride layer and barrier dielectric layer, to expose the metal layer, wherein the etching is performed using a compound which passivates the metal layer by creating a protective film from the reaction of the compound with the metal layer; and
exhuming the masking layer.
8 . The method of claim 7 , wherein the compound is a fluorine based compound.
9 . The method of claim 8 , wherein the metal layer is copper.
10 . The method of claim 9 , wherein the fluorine based compound is one of CF4, SF6, NF3, CHF3 and CH2F2.
11 . The method of claim 7 , wherein contact critical dimension blowout is prevented by performing etching of multiple layers simultaneously in the presence of a masking layer.
12 . The method of claim 7 , wherein the oxide film is a Barrier Low-k (BLOK) film and the masking layer is one of a carbon film or underlayer film.
13 . The method of claim 12 , wherein exhuming the masking layer is performed using an oxygen based plasma.
14 . The method of claim 13 , wherein the BLOK film is a film deposited on the metal layer and is thinner than the metal layer.
15 . The method of claim 2 , further comprising removing the protective film from cell structure to prevent interaction of the compound with later applied processes.
16 . The method of claim 15 , wherein removing the protective film from the cell structure is performed by sputter cleaning.
17 . The method of claim 16 , wherein the sputter cleaning is performed using in-situ H2 or H2-Ar plasma.
18 . The method of claim 7 , further comprising removing the protective film from cell structure to prevent interaction of the compound with later applied processes.
19 . The method of claim 18 , wherein removing the protective film from the cell structure is performed by sputter cleaning.
20 . The method of claim 19 , wherein the sputter cleaning is performed using in-situ H2 or H2-Ar plasma.