Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method

1. An apparatus for processing a substrate, said apparatus comprising:

a polishing section configured to polish a substrate;

a transfer mechanism configured to transfer the substrate; and

a cleaning section configured to clean and dry the polished substrate, said cleaning section having plural cleaning lines for cleaning plural substrates,

wherein said plural cleaning lines include plural primary cleaning modules for performing a primary cleaning operation on the substrate and plural secondary cleaning modules for performing a secondary cleaning operation on the substrate, and

wherein said plural primary cleaning modules are aligned along a vertical direction and said plural secondary cleaning modules are aligned along a vertical direction.

2. The apparatus according to claim 1 , wherein said cleaning section includes a sorting mechanism configured to sort the polished substrates into said plural cleaning lines.

3. The apparatus according to claim 1 , wherein said cleaning section includes a first transfer robot which can access said plural primary cleaning modules and said plural secondary cleaning modules, and a second transfer robot which can access said plural secondary cleaning modules.

4. The apparatus according to claim 3 , further comprising:

a detector configured to detect failure of any one of said plural primary cleaning modules and said plural secondary cleaning modules; and

a controller configured to select a cleaning line bypassing a broken cleaning module which is detected by said detector, said broken cleaning module being one of said plural primary cleaning modules and said plural secondary cleaning modules, and said controller being configured to switch a current cleaning line, including the broken cleaning module, to the selected cleaning line.

5. The apparatus according to claim 3 , further comprising:

a controller configured to select a cleaning line bypassing a busy cleaning module which is cleaning a preceding substrate, said busy cleaning module being one of said plural primary cleaning modules and said plural secondary cleaning modules, and said controller being configured to control said first transfer robot or said second transfer robot so as to clean the substrate in the selected cleaning line.

6. The apparatus according to claim 3 , wherein said cleaning section includes a temporary base on which the substrate is placed temporarily, and

the apparatus further comprising a controller configured to control said first transfer robot such that said first transfer robot transports the substrate to said temporary base and further transports the substrate from said temporary base to one of said plural secondary cleaning modules to thereby skip the primary cleaning operation on the substrate in any one of said plural primary cleaning modules.

7. The apparatus according to claim 3 , wherein said cleaning section includes a temporary base on which the substrate is placed temporarily, and

the apparatus further comprises a controller configured to control said first transfer robot and said second transfer robot such that said first transfer robot transports the substrate from one of said plural primary cleaning modules to said temporary base and said second transfer robot removes the substrate from said temporary base to thereby skip the secondary cleaning operation on the substrate in any one of said plural secondary cleaning modules.

8. The apparatus according to claim 1 , wherein said plural cleaning lines include a temporary base on which the substrate is placed temporarily.

9. The apparatus according to claim 1 , wherein said cleaning section includes plural drying modules for drying the plural substrates cleaned by said plural cleaning lines.

10. The apparatus according to claim 9 , wherein said plural drying modules are aligned along a vertical direction.

11. The apparatus according to claim 1 , wherein said cleaning section includes a first transfer robot and a second transfer robot each configured to sort the polished substrates into said plural cleaning lines.

12. The apparatus according to claim 11 , wherein:

said first transfer robot is configured to move in the vertical direction along a vertically-extending first support shaft to be able to access said plural primary cleaning modules and said plural secondary cleaning modules; and

said second transfer robot is configured to move in the vertical direction along a vertically-extending second support shaft to be able to access said plural secondary cleaning modules.

13. The apparatus according to claim 12 , wherein each of said plural primary cleaning modules is configured to perform the primary cleaning operation on the substrate while supplying a cleaning liquid onto the substrate, and each of said plural secondary cleaning modules is configured to perform the secondary cleaning operation on the substrate while supplying the cleaning liquid, having a lower concentration than that in the primary cleaning operation, onto the substrate.

14. The apparatus according to claim 12 , wherein each of said plural primary cleaning modules is configured to perform the primary cleaning operation for a first cleaning time, and each of said plural secondary cleaning modules is configured to perform the secondary cleaning operation for a second cleaning time that is substantially equal to the first cleaning time.

15. The apparatus according to claim 12 , further comprising:

a detector configured to detect failure of any one of said plural primary cleaning modules and said plural secondary cleaning modules; and

a controller configured to select a cleaning line that bypasses a broken cleaning module which is detected by said detector, said broken cleaning module being one of said plural primary cleaning modules and said plural secondary cleaning modules, and said controller being configured to switch a current cleaning line, including the broken cleaning module, to the selected cleaning line.

16. The apparatus according to claim 1 , wherein said plural cleaning lines are arranged in parallel.

17. An apparatus for processing a substrate, said apparatus comprising:

a polishing section configured to polish a substrate;

a transfer mechanism configured to transfer the substrate; and

a cleaning section configured to clean and dry the polished substrate, said cleaning section having plural cleaning lines for cleaning plural substrates,

wherein said plural cleaning lines include plural primary cleaning modules for performing a primary cleaning operation on the substrate and plural secondary cleaning modules for performing a secondary cleaning operation on the substrate, and

said cleaning section includes a first transfer robot which can access said plural primary cleaning modules and said plural secondary cleaning modules, and a second transfer robot which can access said plural secondary cleaning modules.

18. The apparatus according to claim 17 , further comprising:

a detector configured to detect failure of any one of said plural primary cleaning modules and said plural secondary cleaning modules; and

a controller configured to select a cleaning line bypassing a broken cleaning module which is detected by said detector, said broken cleaning module being one of said plural primary cleaning modules and said plural secondary cleaning modules, and said controller being configured to switch a current cleaning line, including the broken cleaning module, to the selected cleaning line.

19. The apparatus according to claim 17 , further comprising:

a controller configured to select a cleaning line bypassing a busy cleaning module which is cleaning another substrate, said busy cleaning module being one of said plural primary cleaning modules and said plural secondary cleaning modules, and said controller being configured to control said first transfer robot or said second transfer robot so as to switch a current cleaning line to the selected cleaning line.

20. The apparatus according to claim 17 , wherein said cleaning section includes a temporary base on which the substrate is placed temporarily, and

the apparatus further comprises a controller configured to control said first transfer robot such that said first transfer robot transports the substrate to said temporary base and further transports the substrate from said temporary base to one of said plural secondary cleaning modules to thereby skip the primary cleaning operation on the substrate in any one of said plural primary cleaning modules.

21. The apparatus according to claim 17 , wherein said cleaning section includes a temporary base on which the substrate is placed temporarily, and

the apparatus further comprises a controller configured to control said first transfer robot and said second transfer robot such that said first transfer robot transports the substrate from one of said plural primary cleaning modules to said temporary base and said second transfer robot removes the substrate from said temporary base to thereby skip the secondary cleaning operation on the substrate in any one of said plural secondary cleaning modules.