Image pickup device, method of manufacturing image pickup device, and electronic apparatus
View Patent ↗An image pickup device includes: a photodiode provided in a silicon substrate, and configured to generate electric charge corresponding to an amount of received light, by performing photoelectric conversion; and a transfer transistor provided at an epitaxial layer on the silicon substrate, and configured to transfer the electric charge generated in the photodiode, wherein the transfer transistor includes a gate electrode and a channel region, the gate electrode being embedded in the epitaxial layer, and the channel region surrounding the gate electrode, and the channel region has, in a thickness direction, a concentration gradient in which a curvature of a potential gradient is free from a mixture of plus and minus signs.
1. An image pickup device comprising:
a photodiode provided in a silicon substrate, and configured to generate electric charge corresponding to an amount of received light, by performing photoelectric conversion; and
a transfer transistor provided at an epitaxial layer on the silicon substrate, and configured to transfer the electric charge generated in the photodiode,
wherein the transfer transistor includes a gate electrode and a channel region, the gate electrode being embedded in the epitaxial layer, and the channel region surrounding the gate electrode, and
the channel region has, in a thickness direction, a concentration gradient in which a curvature of a potential gradient is free from a mixture of plus and minus signs.
2. The image pickup device according to claim 1 , wherein the channel region is formed by providing concentration distribution in the thickness direction, in a process of performing In-Situ Dope epitaxial growth.
3. The image pickup device according to claim 2 , wherein the channel region has a a concentration distribution in which a curvature of a concentration gradient in the thickness direction is free from a mixture of plus and minus signs.
4. The image pickup device according to claim 3 , wherein
the channel region is of one conductivity type in the thickness direction, and
the channel region is a single layer.
5. The image pickup device according to claim 4 , wherein
the epitaxial layer includes a trench passing through the epitaxial layer,
the gate electrode is formed to fill the trench, and
the channel region is formed on a side face of the trench and a part in proximity to the side face.
6. The image pickup device according to claim 5 , wherein
the silicon substrate includes an impurity region provided in a part of the silicon substrate, the part being immediately above the photodiode, and the impurity region having a concentration lower than an impurity concentration of the photodiode, and
a base of the trench is in contact with the impurity region.
7. An electronic apparatus comprising:
an image pickup device; and
a signal processing circuit configured to perform predetermined processing on a pixel signal outputted from the image pickup device,
wherein the image pickup device includes
a photodiode provided in a silicon substrate, and configured to generate electric charge corresponding to an amount of received light, by performing photoelectric conversion, and
a transfer transistor provided at an epitaxial layer on the silicon substrate, and configured to transfer the electric charge generated in the photodiode,
the transfer transistor includes a gate electrode and a channel region, the gate electrode being embedded in the epitaxial layer, and the channel region surrounding the gate electrode, and
the channel region has, in a thickness direction, a concentration gradient in which a curvature of a potential gradient is free from a mixture of plus and minus signs.