Liquid crystal polymer composition, liquid crystal display and method for manufacturing the same

1. A method for manufacturing a liquid crystal display device, the method comprising:

forming a cell by attaching a thin film transistor (TFT) array substrate and a color filter array substrate;

injecting a liquid crystal polymer composition including a liquid crystal, acrylic monomers including an acrylic monomer group (A) including a cyclic ring and an acrylic monomer group (B) including a chain structure or a cyclohexanol, and a photo initiator into the cell; and

irradiating UV light to the cell to cure the acrylic monomers to form barrier ribs,

wherein irradiating UV light to the cell includes:

a first UV irradiation process for separating phase of the acrylic monomers, wherein intensity of the first UV illumination ranges from 1 mW to 20 mW, and time duration for UV irradiation ranges from 5 minutes to 60 minute;

a room temperature leaving process in which the acrylic monomers are left for 60 minutes to 200 minutes to be phase-separated and cured continuously after the first UV irradiation process is finished; and

a second UV irradiation process for completing curing of the acrylic monomers, a illumination intensity of the second UV irradiation process being larger than that of the first UV irradiation process, wherein intensity of the second UV illumination ranges from 50 mW to 1500 mW, and time duration for UV irradiation ranges from 1 minute to 20 minutes.

2. The method of claim 1 , wherein, in the second UV irradiation process, the temperature is 60° C. or lower.

3. The method of claim 1 , wherein the forming of the TFT array substrate comprises:

forming a TFT on a lower substrate;

forming an organic insulating layer on the TFT;

patterning the organic insulating layer to form a contact hole and at least one first recess;

forming a pixel electrode on the organic insulating layer;

forming a passivation layer on the organic insulating layer and the pixel electrode to form at least one second recess corresponding to the at least one first recess; and

forming a common electrode on the passivation layer.

4. The method of claim 3 , wherein the barrier ribs are positioned to fill the at least one second recess formed in the passivation layer.

5. The method of claim 4 , wherein the at least one first recess and the at least one second recess are positioned to correspond to a gate line.

6. The method of claim 3 , wherein the forming of the color filter array substrate comprises:

forming black matrices and color filters on an upper substrate;

forming an overcoat layer on the black matrices and the color filters; and

patterning the overcoat layer to form at least one third recess.

7. The method of claim 6 , wherein the barrier ribs are positioned to fill the at least one third recess formed in the overcoat layer.