IP Library Granted Patent US 9,637,836
Granted Patent B2
US 9,637,836 · App. 14/321,053 · Granted May 2, 2017

Electrochemical deposition apparatus and methods for controlling the chemistry therein

Inventors: Demetrius Papapanayiotou (Westford, MA); Arthur Keigler (Wellesley, MA); Jonathan Hander (Westford, MA); Johannes Chiu (Bedford, MA); David G. Guarnaccia (Carlisle, MA); Daniel L. Goodman (Lexington, MA)
Assignee: TEL NEXX, INC.
C25D21/14C25D7/12C25D17/00C25D17/001C25D17/002C25D21/18
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Quick Facts
Patent No.
US 9,637,836
App. No.
14/321,053
Granted
May 2, 2017
Kind
B2
Abstract

An electrochemical deposition system is described. The electrochemical deposition system includes one or more electrochemical deposition modules arranged on a common platform for depositing one or more metals on a substrate, and a chemical management system coupled to the one or more electrochemical deposition modules. The chemical management system is configured to supply at least one of the one or more electrochemical deposition modules with one or more metal constituents for depositing the one or more metals. The chemical management system can include at least one metal enrichment cell and at least one metal-concentrate generator cell.

Claims (33)

1. An electrochemical deposition system, comprising:

one or more electrochemical deposition modules arranged on a common platform for depositing one or more metals on a substrate; and

a chemical management system coupled to said one or more electrochemical deposition modules, and configured to supply at least one of said one or more electrochemical deposition modules with one or more metal constituents for depositing said one or more metals, said chemical management system including:

at least one metal enrichment cell that replenishes at least one of said one or more metal constituents and supplies said replenished metal constituent to at least one of said one or more electrochemical deposition modules in a synchronous manner with depositing said one or more metals on said substrate, and

at least one metal-concentrate generator cell that generates a concentrated solution of at least one of said one or more metal constituents and doses at least one of said one or more electrochemical deposition modules with said concentrated metal constituent in an asynchronous manner or synchronous manner with depositing said one or more metals on said substrate.

2. The system of claim 1 , wherein said chemical management system is located on said common platform proximate said one or more electrochemical deposition modules.

3. The system of claim 1 , wherein said common platform is located on a fab floor, and said chemical management system is located on a sub-fab floor.

4. The system of claim 1 , wherein said common platform comprises:

a wet area that includes said one or more electrochemical deposition modules; and

a dry area coupled to said wet area, and configured to receive one or more substrates from a fab environment and transfer said one or more substrates into and out of said wet area.

5. The system of claim 1 , wherein said at least one metal-concentrate generator cell generates said concentrated solution at a metal concentration that exceeds about 100 g/l.

6. The system of claim 1 , wherein said metal enrichment cell replenishes said at least one of said one or more metal constituents at a metal concentration that is less than about 100 g/l.

7. The system of claim 1 , wherein at least one of said one or more electrochemical deposition modules includes a soluble anode.

8. The system of claim 1 , wherein at least one of said one or more electrochemical deposition modules includes an insoluble anode.

9. The system of claim 1 , wherein at least one of said one or more electrochemical deposition modules includes an ion exchange membrane.

10. The system of claim 9 , wherein said ion exchange membrane includes a cationic membrane or an anionic membrane.

11. The system of claim 1 , wherein said at least one metal-concentrate generator cell comprises:

a metal-concentrate generator cell that defines an anode region, a cathode region, and a metal-ion capture region disposed between said anode region and said cathode region, said metal concentrate generator cell including a soluble anode disposed in said anode region, an inert cathode disposed in said cathode region, a first ion exchange membrane disposed between said anode region and said metal-ion capture region, and a second ion exchange membrane disposed between said cathode region and said metal-ion capture region;

a power source electrically coupled to said soluble anode and said inert cathode that generates metal-ions from said soluble anode when electrical current flows between said soluble anode and said inert cathode;

an anolyte reservoir and first pump that circulates said anolyte through said anode region of said metal-concentrate generator cell; and

a metal-concentrate dispensing system coupled to an output of said first pump via a first valve, and arranged to supply doses of said metal-concentrate to at least one of said one or more electrochemical deposition modules.

12. The system of claim 1 , wherein said at least one metal enrichment cell comprises:

an anode region and a cathode region, said metal enrichment cell including a soluble anode disposed in said anode region, an inert cathode disposed in said cathode region, and at least one ion exchange membrane disposed between said anode region and said cathode region;

a power source electrically coupled to said soluble anode and said inert cathode that generates metal-ions from said soluble anode when electrical current flows between said soluble anode and said inert cathode;

a catholyte reservoir and first pump that circulates said catholyte through said cathode region of said metal enrichment cell; and

a metal enrichment circulation line and a second pump arranged to circulate a metal depleted process electrolyte from a process region of at least one of said one or more electrochemical deposition modules through said anode region of said metal enrichment cell, and supply a process electrolyte enriched by metal from said soluble anode to said process region of said at least one of said one or more electrochemical deposition modules.

13. The system of claim 1 , wherein said at least one metal enrichment cell comprises:

an anode region, a cathode region, and a plating solution enrichment region disposed between said anode region and said cathode region, said metal enrichment cell including a soluble anode disposed in said anode region, an inert cathode disposed in said cathode region, a first ion exchange membrane disposed between said anode region and said plating solution enrichment region, and a second ion exchange membrane disposed between said cathode region and said plating solution enrichment region;

a power source electrically coupled to said soluble anode and said inert cathode that generates metal-ions from said soluble anode when electrical current flows between said soluble anode and said inert cathode;

an anolyte reservoir and first pump that circulates said anolyte through said anode region of said metal enrichment cell;

a catholyte reservoir and second pump that circulates said catholyte through said cathode region of said metal enrichment cell; and

a metal enrichment circulation line and a third pump arranged to circulate a metal depleted process electrolyte from a process region of at least one of said one or more electrochemical deposition modules through said plating solution enrichment region of said metal enrichment cell, and supply a process electrolyte enriched by metal from said soluble anode to said process region of said at least one of said one or more electrochemical deposition modules.

14. The system of claim 13 , wherein the metal enrichment cell comprises four chambers.

Assignments (3)
CHANGE OF NAME Recorded Nov 21, 2022
From: ASM NEXX INC.
To: ASMPT NEXX, INC.
Reel/Frame 061974/0874 →
CHANGE OF NAME Recorded Jan 14, 2019
From: TEL NEXX, INC.
To: ASM NEXX, INC.
Reel/Frame 048068/0928 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 10, 2014
From: PAPAPANAYIOTOU, DEMETRIUS; KEIGLER, ARTHUR; HANDER, JONATHAN; CHIU, JOHANNES; GUARNACCIA, DAVID G.; GOODMAN, DANIEL L.
To: TEL NEXX, INC.
Reel/Frame 033287/0070 →
Continuity (2)
Provisional Application 61842801 · Jul 3, 2013
Related Publication 20150008119A1 · Jan 8, 2015