Aluminum oxide landing layer for conductive channels for a three dimensional circuit device
View Patent ↗A multitier stack of memory cells having an aluminum oxide (AlOx) layer as a noble HiK layer to provide etch stop selectivity. Each tier of the stack includes a memory cell device. The circuit includes a source gate select polycrystalline (SGS poly) layer adjacent the multitier stack of memory cells, wherein the SGS poly layer is to provide a gate select signal for the memory cells of the multitier stack. The circuit also includes a conductive source layer to provide a source conductor for a channel for the tiers of the stack. The AlOx layer is disposed between the source layer and the SGS poly layer and provides both dry etch selectivity and wet etch selectivity for creating a channel to electrically couple the memory cells to the source layer.
1. A circuit device comprising:
a semiconductor substrate with a conductive source layer to provide a source conductor for a channel;
a multitier stack of memory cells, each tier of the multitier stack including a memory cell device;
a source gate select polycrystalline (SGS poly) layer over the source layer and between the multitier stack and the source layer, the SGS poly layer to provide a gate select signal to selectively conduct charge from the source conductor to the memory cell devices; and
an aluminum oxide (AlOx) layer between the source layer and the SGS poly layer, the AlOx layer to provide an etch stop layer to separate the SGS poly layer from the source layer, wherein the AlOx layer to provide both dry etch selectivity and wet etch selectivity, wherein a channel etch is to etch through the multitier stack of memory cells and the SGS poly layer, and stop at the AlOx layer and not expose the source layer, and wherein a selective gate etch is to etch gate contacts in the memory cells and to etch through the AlOx layer to expose the source layer.
2. The circuit device of claim 1 , wherein the SGS poly layer comprises a p-type doped polysilicon.
3. The circuit device of claim 1 , wherein the source layer includes one or more of tungsten silicide, heavily doped polysilicon, or poly-tungsten silicide.
4. The circuit device of claim 1 , wherein the source layer comprises an n-type doped polysilicon.
5. The circuit device of claim 1 , wherein the AlOx layer further comprises:
a floating gate to be triggered by the gate select signal to provide current from the source layer to the multitier stack of memory cells.
6. The circuit device of claim 5 , wherein the channel comprises a hollow channel extending through the multitier stack, the hollow channel including conductive material surrounding a channel insulator to provide electrical contact to gates of the memory cells;
wherein the floating gate of the AlOx layer is to provide current from the source layer to the hollow channel.
7. The circuit device of claim 1 , further comprising:
an oxide layer between the AlOx layer and the SGS poly layer.
8. The circuit device of claim 1 , further comprising:
an oxide layer between the AlOx layer and the source layer.
9. An electronic device comprising:
a three-dimensional stacked memory device to store data, the three-dimensional stacked memory device including:
a semiconductor substrate with a conductive source layer to provide a source conductor for a channel;
a multitier stack of memory cells, each tier of the multitier stack including a memory cell device;
a source gate select polycrystalline (SGS poly) layer over the source layer and between the multitier stack and the source layer, the SGS poly layer to provide a gate select signal to selectively conduct charge from the source conductor to the memory cell devices; and
an aluminum oxide (AlOx) layer between the source layer and the SGS poly layer, the AlOx layer to provide an etch stop layer to separate the SGS poly layer from the source layer, wherein the AlOx layer to provide both dry etch selectivity and wet etch selectivity, wherein a channel etch is to etch through the multitier stack of memory cells and the SGS poly layer, and stop at the AlOx layer and not expose the source layer, and wherein a selective gate etch is to etch gate contacts in the memory cells and to etch through the AlOx layer to expose the source layer; and
a high-definition display coupled to generate a display based on data stored in the memory device.
10. The electronic device of claim 9 , wherein the source layer includes one or more of tungsten silicide, heavily doped polysilicon, or poly-tungsten silicide.
11. The electronic device of claim 9 , wherein the AlOx layer further comprises:
a floating gate to be triggered by the gate select signal to provide current from the source layer to the multitier stack of memory cells.
12. The electronic device of claim 11 , wherein the channel comprises a hollow channel extending through the multitier stack, the hollow channel including conductive material surrounding a channel insulator to provide electrical contact to gates of the memory cells;
wherein the floating gate of the AlOx layer is to provide current from the source layer to the hollow channel.
13. The electronic device of claim 9 , wherein the three-dimensional stacked memory device further comprises:
an oxide layer between the AlOx layer and the SGS poly layer.
14. The electronic device of claim 9 , wherein the three-dimensional stacked memory device further comprises:
an oxide layer between the AlOx layer and the source layer.