Charged particle beam apparatus permitting high-resolution and high-contrast observation
View Patent ↗A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.
1. A charged particle beam apparatus for detecting secondary charged particles or tertiary charged particles generated in response to irradiating a sample with a primary charged particle beam, the charged particle beam apparatus comprising:
an objective lens that focuses the primary charged particle beam on the sample;
a power supply unit that applies a retarding voltage to the sample; and
a detector that is disposed above the objective lens and detects the secondary charged particles or the tertiary charged particles,
wherein the objective lens includes:
an opening through which the primary charged particle beam passes;
an upper magnetic pole member disposed around a central axis passing through the opening and in which a magnetic flux supplied from an excitation member operates as an upper magnetic pole of the objective lens; and
a lower magnetic pole member disposed around the central axis passing through the opening, having a lower surface that is opposed to an upper surface of the sample, and operating as a lower magnetic pole that corresponds to the upper magnetic pole,
wherein an upper surface of the lower magnetic pole member to which the magnetic flux is supplied and a surface which supplies the magnetic flux to the lower magnetic pole member are disposed so as to face each other in a thickness direction.
2. The charged particle beam apparatus according to claim 1 , wherein a potential at the lower magnetic pole member is controlled to be lower than a potential at the upper magnetic pole member.
3. The charged particle beam apparatus according to claim 1 , wherein a potential that is higher than the retarding voltage is supplied to the lower magnetic pole member.
4. The charged particle beam apparatus according to claim 1 , wherein a potential difference between a potential at the sample and the potential at the lower magnetic pole member is within 100V.
5. The charged particle beam apparatus according to claim 1 , wherein the potential at the lower magnetic pole member is equal to a potential of the sample.
6. The charged particle beam apparatus according to claim 1 , wherein the objective lens is a semi-in-lens type objective lens.
7. The charged particle beam apparatus according to claim 1 , wherein the upper magnetic pole member is brought to a ground potential.
8. The charged particle beam apparatus according to claim 1 , wherein a lower surface of the upper magnetic pole member extends about the opening in a conical shape, and wherein the lower magnetic pole member is configured with a magnetic plate that is disposed in parallel with the conically-shaped lower surface of the upper magnetic pole member at a predetermined gap from the lower surface of the upper magnetic pole member.
9. The charged particle beam apparatus according to claim 1 , further comprising an electrostatic adsorption device that holds the sample.
10. The charged particle beam apparatus according to claim 9 , wherein the electrostatic adsorption device includes an internal electrode that opposes to the sample and a contact electrode that applies the retarding voltage to the sample, wherein a dielectric layer is disposed between the internal electrode and the sample, and wherein the electrostatic adsorption device is configured to retain a potential difference between a potential at the contact electrode and the potential at the lower magnetic pole member at a value falling within .+−.100V.
11. The charged particle beam apparatus according to claim 1 , further comprising a cooling member for the lower magnetic pole member.
12. The charged particle beam apparatus according to claim 1 , further comprising means for acquiring a shaded image of a portion of irradiation of the primary charged particle beam.
13. The charged particle beam apparatus according to claim 1 , wherein the lower magnetic pole member includes an upper magnetic plate and a lower magnetic plate, and wherein the lower magnetic plate is brought to a same potential as a potential at the sample.
14. The charged particle beam apparatus according to claim 1 , wherein the lower surface of the lower magnetic pole member extends so as to face the upper surface of the sample and the upper surface of the lower magnetic pole member extends so as to be wider than an area of the surface which supplies the magnetic flux to the lower magnetic pole member.
15. A charged particle beam apparatus for detecting secondary charged particles or tertiary charged particles generated in response to irradiating a sample with a primary charged particle beam, the charged particle beam apparatus comprising:
an objective lens that focuses the primary charged particle beam on the sample;
a power supply unit that applies a retarding voltage to the sample;
a detector that is disposed above the objective lens and detects the secondary charged particles or the tertiary charged particles; and
an image output unit,
wherein the objective lens includes:
an opening through which the primary charged particle beam passes;
an upper magnetic pole member disposed around a central axis of the primary charged particle beam that passes through the opening and in which a magnetic flux supplied from an excitation member operates, as an upper magnetic pole of the objective lens; and
a lower magnetic pole member disposed around the central axis of the primary charged particle beam passing through the opening, having a lower surface that is opposed to an upper surface of the sample, having an upper surface that is opposed to a lower surface of the upper magnetic pole member, and operating as a lower magnetic pole that corresponds to the upper magnetic pole,
wherein a potential at the lower magnetic pole member is controlled to be lower than a potential at the upper magnetic pole member, and
wherein the image output unit outputs a top-view image based on a detection result of the detector.