ADHESIVE FILM HAVING GOOD MACHINABILITY FOR PROTECTING THE SURFACE OF A SEMICONDUCTOR WAFER
The present invention relates to an adhesive film for protecting a wafer including an adhesive layer formed on one surface of a substrate film. The present invention relates to an adhesive film for protecting the surface of a semiconductor wafer, wherein the surface film has a tensile strength of 2-10 kg/mm 2 and an elongation until breakage of 50-200%, and the gel content of the adhesive layer is greater than or equal to 80%. The adhesive film for protecting the wafer maintains cutting ability and machinability, while preventing the generation of bending and wafer breaking phenomena due to the decrease of the wafer thickness. In addition, the adhesive film may not melt at high temperatures, and the yield while grinding the wafer may be increased.
1 . An adhesive film for protecting a surface of a semiconductor wafer, comprising:
a base film; and
an adhesive layer formed on one surface of the base film,
wherein the base film has a tensile strength from 2 kg/mm 2 to 10 kg/mm 2 and an elongation at break from 50% to 200%, and the adhesive layer has a gel content of 80% or more.
2 . The adhesive film according to claim 1 , wherein the adhesive film has higher peel strength before UV irradiation than peel strength after UV irradiation.
3 . The adhesive film according to claim 1 , wherein the adhesive film has a peel strength before UV irradiation from 400 g/in to 1200 g/in, and a peel strength after UV irradiation from 20 g/in to 200 g/in.
4 . The acrylic resin film according to claim 1 , wherein the base film comprises at least one selected from the group consisting of polyvinyl chloride, polyurethane, polyolefin, ethylene-vinyl acetate copolymer, and ethylene-alkyl acrylate copolymer films.
5 . The acrylic resin film according to claim 1 , wherein the base film has a thickness from 50 μm to 300 μm.
6 . A method for preparing an adhesive film for protecting a surface of a semiconductor wafer, comprising:
forming a base film;
controlling tensile strength and elongation at break of the base film;
forming an adhesive layer on one surface of the base film; and
performing UV curing of the base film on which the adhesive layer is formed.
7 . The method according to claim 6 , wherein the base film is controlled to a tensile strength from 2 kg/mm 2 to 10 kg/mm 2 and to an elongation at break from 50% to 200%.
8 . The method according to claim 6 , wherein the forming an adhesive layer on one surface of the base film is performed by any one process selected from among roll coating, reverse roll coating, gravure roll coating, bar coating, comma coating, and die coating.
9 . The method according to claim 6 , wherein the adhesive film has a peel strength before UV irradiation from 400 g/in to 1200 g/in, and a peel strength after UV irradiation from 20 g/in to 200 g/in.