Exposure device and method for producing structure
View Patent ↗In order to exposure interference fringes to photoresist and form a desired irregular pattern, it is necessary to know the cycle of the interference fringes in advance. In order to confirm the cycle of the interference fringes beforehand, conventional techniques include observing the formed irregular pattern with the use of a microscope or measuring a diffraction angle of incident light and repeating processes of exposure, development, and observation (measurement) while slightly changing incident angles of light fluxes for the formation of the interference fringes until a desired cycle is confirmed. These operations take considerable amount of time. The fact that it takes considerable amount of time to confirm the interference fringes has not been considered in the conventional techniques. Observation of a moire generated by a standard sample containing a fluorescent sample that can be repeatedly used and adjustment of the cycle of interference fringes reduce time for the adjustment.
1. A production method for producing a structure, comprising the steps of:
illuminating a standard sample having a grating pattern and a fluorescent sample coated on the grating pattern with a first light in an interference exposure;
observing a first moire fringe generated by diffracted and fluorescent light during the illumination of the standard sample;
obtaining a cycle of an interference fringe of the interference exposure from the moire fringe;
removing the standard sample and replacing it with a substrate coated with a photosensitive material; and
exposing the substrate coated with the photosensitive material to the interference exposure to record the interference fringe.
2. The production method according to claim 1 , further comprising the step of:
rotating the standard sample.
3. The production method according to claim 1 , further comprising the steps of:
illuminating the standard sample with a second light in an interference exposure from a direction different from a direction of the first light;
observing a second moire fringe generated between diffracted and fluorescent light during illumination by the second light;
obtaining a cycle of a second interference fringe of the interference exposure by the second light; and
performing a second exposure of the substrate coated with the photosensitive material with to record the second interference fringe,
wherein the cycle of the second interference fringe is different from the cycle of the first interference fringe.
4. An exposure device, comprising:
an illumination system configured to emit light in an interference exposure;
a standard sample configured to receive the light in the interference exposure; and
a camera,
wherein the standard sample includes a diffraction grating coated with a fluorescent sample and generates a moire fringe between diffracted and fluorescent light from the interference exposure, and
wherein the camera observes the moire fringe.
5. The exposure device according to claim 4 , further comprising:
a rotary stage configured to hold the standard sample.
6. The exposure device according to claim 5 , further comprising:
a mirror arranged on the rotary stage in such a manner as to form an angle with the standard sample.