Homogeneous HiPIMS coating method
The invention relates to a HiPIMS method by means of which homogeneous layers can be deposited over the height of a coating chamber. Two partial cathodes are used for said purpose. According to the invention, the length of the individual power pulse intervals applied to the partial cathodes is chosen individually and thus a required coating thickness profile over the height of the coating chamber is achieved.
1. Method for the physical vapor deposition by means of sputtering in an evacuated coating chamber, said method comprising the steps of:
a) arranging a workpiece to be coated over a height of the coating chamber,
b) providing a generator with a predefined power output,
c) switching on the generator,
d) connecting a first partial cathode to the generator so that the first partial cathode is fed with a first power impulse from the generator,
e) separating the generator from the first partial cathode after expiration of a predefined first power impulse interval corresponding to the first partial cathode,
f) connecting a second partial cathode to the generator so that the second partial cathode is fed with a second power impulse from the generator, wherein the first partial cathode and the second partial cathode are provided at different vertical locations over the height of the coating chamber,
g) separating the generator from the second partial cathode after expiration of a predefined second power impulse interval corresponding to the second partial cathode, and
h) selecting respective lengths of the individual power impulse intervals based on the vertical locations of the first partial cathode and the second partial cathode independently and selecting the length of one of the power impulse intervals relative to the length of another of the power impulse intervals such that the layer resulting from the coating has a predefined layer thickness distribution over the height of the coating chamber.
2. Method according to claim 1 , wherein a homogeneous layer thickness distribution is selected as prescribed layer thickness distribution.
3. Method according to claim 1 , wherein the first power impulse interval starts time-wise before the second power impulse interval starts and the first power impulse interval ends time-wise before the second power impulse interval ends, wherein the steps e) and f) are executed in such a manner that the first power impulse interval and the second power impulse interval overlap in time and all power impulse intervals form together a first group, so that the power output from the generator remains sustained without interruption from the beginning of the first power impulse interval until the end of the second power impulse interval and a second power development interval does not occur.
4. Method according to claim 1 , wherein more than two partial cathodes are used and the steps d) to h) are applied to them in an analogous manner.
5. Method according to claim 1 , wherein at least the relative length of the power pulse intervals is determined by means of a calibration coating prior to the coating.
6. Method according to claim 1 , wherein the power output is constant at least after switching on and after expiration of a power buildup interval.
7. Method according to claim 1 , wherein the physical vapor deposition is conducted by means of high power impulse magnetron sputtering (“HIPIMS”) by applying to the first partial cathode and the second partial cathode power densities between 250 W/cm 2 and 2000 W/cm 2 .
8. Method according to claim 1 , wherein:
the second partial cathode is arranged at a vertical position over the height of the coating chamber that is higher than the vertical position of the first partial cathode; and
the length of the second power impulse interval is longer than the length of the first power impulse interval.