IP Library Granted Patent US 9,406,583
Granted Patent B2
US 9,406,583 · App. 14/370,391 · Granted Aug 2, 2016

COF type semiconductor package and method of manufacturing the same

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,406,583
App. No.
14/370,391
Granted
Aug 2, 2016
Kind
B2
Abstract

Provided is a chip on film (COF) type semiconductor package. The COF type semiconductor device includes a flexible film, an electrode pattern formed on the flexible film, a semiconductor device disposed on the electrode pattern, a conductive pad disposed between the electrode pattern and the semiconductor device to electrically connect the semiconductor device with the electrode pattern, and a first protective layer which seals the conductive pad and the semiconductor device and is formed on a portion of the electrode pattern and the semiconductor device. The first protective layer includes a heat conductive material for dissipating heat generated from the semiconductor device.

Claims (26)

1. A chip on film (COF) type semiconductor package, comprising:

a flexible film;

an electrode pattern formed on the flexible film;

a semiconductor device disposed on the electrode pattern;

a conductive pad disposed between the electrode pattern and the semiconductor device to electrically connect the semiconductor device with the electrode pattern; and

a first protective layer that covers an entire outside surface of the flexible film to seal the conductive pad and the semiconductor device and is formed directly on a portion of the electrode pattern and the semiconductor device,

wherein the first protective layer includes: a heat conductive material for dissipating heat generated from the semiconductor device; and an adhesive material.

2. The COF type semiconductor package of claim 1 , further comprising a second protective layer formed on the electrode pattern to be spaced apart from the conductive pad,

wherein the first protective layer seals a space between the semiconductor device, the conductive pad, and the second protective layer.

3. The COF type semiconductor package of claim 2 , wherein the first protective layer comprises:

an underfill formed in a space between the second protective layer and the conductive pad; and

an upperfill formed on the semiconductor device, the underfill, and a portion of the second protective layer.

4. The COF type semiconductor package of claim 1 ,wherein the heat conductive material comprises aluminum oxide or iron oxide, and

the adhesive material comprises a resin composition including an epoxy resin and imidazole or a resin composition including an epoxy resin and amine.

5. The COF type semiconductor package of claim 1 , wherein the first protective layer comprises the heat conductive material in an amount of 80 wt % to 90 wt % and the adhesive material in an amount of 1 wt % to 10 wt %.

6. The COF type semiconductor package of claim 1 , wherein the conductive pad is formed in one piece with the semiconductor device under the semiconductor device.

7. The COF type semiconductor package of claim 1 , wherein the first protective layer is formed by coating or depositing a heat dissipation paint comprising the heat conductive material.

8. The COF type semiconductor package of claim 1 , wherein the first protective layer is continuously formed along a top surface and sides of the semiconductor device, sides of the conductive pad, and a top surface of the portion of the electrode pattern.

9. A chip on film (COF) type semiconductor package comprising:

a base film formed of a flexible material;

an electrode pattern formed on a first surface of the base film;

a semiconductor device mounted on the electrode pattern;

a protective layer formed on the electrode pattern and formed of an insulation material;

an underfill filled in a space between the semiconductor device and the protective layer; and

a heat dissipation layer formed on a second surface of the base film to dissipate heat generated from the semiconductor device,

wherein the heat dissipation layer comprises a heat conductive material and an adhesive material.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 21, 2024
From: DB HITEK CO., LTD.
To: DB GLOBALCHIP CO., LTD.
Reel/Frame 067800/0572 →
CHANGE OF NAME Recorded Nov 30, 2017
From: DONGBU HITEK CO., LTD.
To: DB HITEK CO., LTD.
Reel/Frame 044559/0819 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 8, 2014
From: KIM, SUNG JIN; KIM, JUN IL; KIM, HAG MO
To: DONGBU HITEK CO., LTD.
Reel/Frame 033261/0975 →