Molybdenum allyl complexes and use thereof in thin film deposition
Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R 1 , R 3 , R 5 , R 7 , R 8 and R 10 are independently and at each occurrence alkyl; R 2 , R 6 and R 9 are independently alkyl; R 4 and R 11 are independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl; x, z, a, c, d and f are independently zero, 1, or 2; y, b and e are independently zero or 1; and n and m are independently zero to 5.
1. An organometallic complex corresponding in structure to Formula I:
wherein
R 1 and R 3 are independently and at each occurrence alkyl;
R 2 is alkyl;
R 4 is independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl;
x and z are independently zero, 1, or 2;
y is zero or 1; and
n is 1 to 4; wherein
when n is 1, R 1 or R 3 , if present, is C 2 -C 8 -alkyl.
2. The organometallic complex of claim 1 , wherein R 1 , R 3 and R 4 are independently and at each occurrence C 1 -C 8 -alkyl; R 2 is alkyl, and wherein
when n is 1, R 1 or R 3 , if present, is C 2 -C 8 -alkyl.
3. The organometallic complex of claim 1 , wherein n is 1.
4. The organometallic complex of claim 1 , wherein n is 2 to 4.
5. The organometallic complex of claim 1 , wherein x and z are zero.
6. The organometallic complex of claim 5 , wherein y is 1.
7. The organometallic complex of claim 1 , wherein the complex is: