Fine concavo-convex structure product, heat-reactive resist material for dry etching, mold manufacturing method and mold
A fine concavo-convex structure product ( 10 ) is provided with an etching layer ( 11 ), and a resist layer ( 12 ) comprised of a heat-reactive resist material for dry etching provided on the etching layer ( 11 ), a concavo-convex structure associated with opening portions ( 12 a ) formed in the resist layer ( 12 ) is formed in the etching layer ( 11 ), a pattern pitch P of a fine pattern of the concavo-convex structure ranges from 1 nm to 10 μm, a pattern depth H of the fine pattern ranges from 1 nm to 10 μm, and a pattern cross-sectional shape of the fine pattern is a trapezoid, a triangle or a mixed shape thereof. The heat-reactive resist material for dry etching has, as a principal constituent element, at least one species selected from the group consisting of Cu, Nb, Sn, Mn, oxides thereof, nitrides thereof and NiBi.
1. A dry etching material for forming a resist layer on an etching layer, the resist layer comprising:
a heat-reactive resist material for dry etching and forming the resist layer on the etching layer, and the resist layer having opening portions associated with a concavo-convex structure, a pattern pitch P of a fine pattern of the concavo-convex structure ranges from 1 nm to 10 μm, a pattern depth H of the fine pattern ranges from 1 nm to 10 μm, a pattern cross-sectional shape of the fine pattern is a trapezoid, triangle or a mixed shape thereof, wherein the heat-reactive resist material contains: an oxide of Cr; and
an additive,
the oxide of Cr is comprised of CrO x (0.5≦X≦0.8), and
the additive is formed by containing at least one material selected from materials that do not form respective compounds with the CrO x (0.5≦X≦0.8)
the additive consists of SiO 2 having a content of 10 mol % or more and 15 mol % or less, the pattern cross-sectional shape satisfies Equation (1)
0≦B 1 <T 0 =T 1 <10μm Eq. (1)
T 0 : Width of the opening portion of the resist layer before dry etching
T 1 : Width of the concave portion on the highest portion side formed in the etching layer after dry etching
B 1 : Width of the concave portion on the deepest portion side formed in the etching layer after dry etching.
2. The dry etching material for forming the resist layer on the etching layer according to claim 1 , wherein the additive is formed by containing at least one selected from the group consisting of Al, Si, Ni, Ge, Mo, Ru, Rh, Pd, Ag, In, Sn, Ta, Ir, Pt, Au, Bi, oxides thereof, nitrides thereof, and mixtures thereof.
3. The dry etching material for forming the resist layer on the etching layer according to claim 1 , wherein the additive contains a silicon oxide.
4. The dry etching material for forming the resist layer on the etching layer according to claim 1 , wherein an additive amount of the additive ranges from 2.0 mol % to 35.0 mol % in terms of mole.
5. The dry etching material for forming the resist layer on the etching layer according to claim 1 , wherein an additive amount of the additive ranges from 5.0 mol % to 15.0 mol % in terms of mole.
6. The dry etching material for forming the resist layer on the etching layer according to claim 1 , wherein the additive is formed by containing at least one selected from a group consisting of Si, Ta, and oxides thereof.