Polishing liquid for metal and polishing method
View Patent ↗The present invention relates to a metal polishing liquid for polishing at least a part of metal in a substrate having the metal, comprising, component A: a metal solubilizer containing amino acids, component B: compounds having the benzotriazole skeleton, and component C: an acrylic acid polymer having the weight average molecular weight of 10,000 or more, and having the mass ratio between the component B and the component C, (component B:component C), to be 1:1 to 1:5. Use of the metal polishing liquid can simultaneously yield high polishing rates and low etching rates at higher level, enabling to form an embedded pattern with higher reliability.
1. A metal polishing liquid for polishing at least a part of metal in a substrate having the metal, comprising
component A: a metal solubilizer containing an amino acid, wherein the metal solubilizer includes at least one of glycine or α-alanine;
component B: a compound having the benzotriazole skeleton selected from the group consisting of benzotriazole, 1-hydroxybenzotriazole or 5-methyl-1H-benzotriazole;
component C: an acrylic acid polymer comprising polyacrylic acid having the weight average molecular weight of 20,000 or more,
an oxidizing agent containing hydrogen peroxide; and
abrasive grains,
wherein the mass ratio between the component B and the component C, (component B:component C), is 1:1 to 1:5.
2. The metal polishing liquid according to claim 1 , wherein pH is in the range of 2 to 6.
3. A metal polishing liquid according to claim 1 , wherein the metal contains at least one type selected from the group consisting of copper, copper alloys, copper oxides, and oxides of copper alloys.
4. A metal polishing liquid according to claim 1 , wherein a mole ratio of the amino acid in the metal solubilizer is at least 90%.
5. The metal polishing liquid according to claim 1 , wherein the amino acid has a molecular weight of 200 or less.
6. The metal polishing liquid according to claim 1 , wherein the amino acid has a molecular weight of 150 or less.
7. The metal polishing liquid according to claim 1 , wherein the metal solubilizer comprises primary amino acids.
8. The metal polishing liquid according to claim 1 , wherein the metal solubilizer comprises primary amino acids having a molecular weight of 200 or less.
9. The metal polishing liquid according to claim 1 , wherein the metal solubilizer comprises primary amino acids having a molecular weight of 150 or less.
10. The metal polishing liquid according to claim 1 , wherein the metal solubilizer includes glycine, α-alanine, β-alanine (3-aminopropanoic acid), or 4-aminobutyric acid.
11. A polishing method comprising polishing a part of metal in a substrate having the metal, wherein the polishing is performed by using the metal polishing liquid according to claim 1 .
12. A metal polishing liquid for polishing at least a part of metal in a substrate having the metal, comprising
component A: a metal solubilizer comprising more than 99 mol % of amino acid, wherein the metal solubilizer includes at least one of glycine or α-alanine;
component B: a compound having the benzotriazole skeleton selected from the group consisting of benzotriazole, 1-hydroxybenzotriazole or 5-methyl-1H-benzotriazole;
component C: an acrylic acid polymer comprising polyacrylic acid having the weight average molecular weight of 20,000 or more,
an oxidizing agent containing hydrogen peroxide; and
abrasive grains,
wherein the mass ratio between the component B and the component C, (component B:component C), is 1:1 to 1:5.
13. The metal polishing liquid according to claim 12 , wherein the amino acid has a molecular weight of 200 or less.
14. The metal polishing liquid according to claim 12 , wherein the amino acid has a molecular weight of 150 or less.
15. The metal polishing liquid according to claim 12 , wherein the metal solubilizer comprises primary amino acids.
16. The metal polishing liquid according to claim 12 , wherein the metal solubilizer comprises primary amino acids having a molecular weight of 200 or less.
17. The metal polishing liquid according to claim 12 , wherein the metal solubilizer includes glycine, α-alanine, β-alanine (3-aminopropanoic acid), or 4-aminobutyric acid.
18. A metal polishing liquid for polishing at least a part of metal in a substrate having the metal, comprising
component A: a metal solubilizer comprising an amino acid and lacking an inorganic acid, wherein the metal solubilizer includes at least one of glycine or α-alanine;
component B: a compound having the benzotriazole skeleton selected from the group consisting of benzotriazole, 1-hydroxybenzotriazole or 5-methyl-1H-benzotriazole;
component C: an acrylic acid polymer comprising polyacrylic acid having the weight average molecular weight of 20,000 or more,
an oxidizing agent containing hydrogen peroxide; and
abrasive grains,
wherein the mass ratio between the component B and the component C, (component B:component C), is 1:1 to 1:5.