IP Library Granted Patent US 9,803,111
Granted Patent B2
US 9,803,111 · App. 14/379,961 · Granted Oct 31, 2017

Adhesive for semiconductor, fluxing agent, manufacturing method for semiconductor device, and semiconductor device

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Quick Facts
Patent No.
US 9,803,111
App. No.
14/379,961
Granted
Oct 31, 2017
Kind
B2
Abstract

An adhesive for a semiconductor, comprising an epoxy resin, a curing agent, and a compound having a group represented by the following formula (1): wherein R 1 represents an electron-donating group.

Claims (15)

1. An adhesive for a semiconductor, comprising an epoxy resin in an amount of 5 to 75% by mass based on the total amount of the adhesive, a curing agent, a phenoxy resin, at least one compound selected from a group consisting of methylsuccinic acid, 2-methylglutaric acid, 2-methyladipic acid, 2-methylpimelic acid, and 2-methylsuberic acid in an amount of 0.5 to 10% by mass based on the total amount of the adhesive, and resin fillers,

wherein a mass ratio of the content of the epoxy resin to the content of the phenoxy resin is 0.01 to 5.

2. The adhesive for a semiconductor according to claim 1 , wherein the at least one compound is a fluxing agent.

3. The adhesive for a semiconductor according to claim 1 , wherein the phenoxy resin has a weight average molecular weight of 10000 or more.

4. The adhesive for a semiconductor according to claim 1 , wherein the adhesive has a film shape.

5. A fluxing agent, comprising at least one compound selected from a group consisting of methylsuccinic acid, 2-methyiglutaric acid, 2-methyladipic acid, 2-methylpimelic acid, and 2-methylsuberic acid, wherein the fluxing agent is blended in an adhesive for a semiconductor comprising an epoxy resin in an amount of 5 to 75% by mass based on the total amount of the adhesive, a curing agent, a phenoxy resin, the fluxing agent in an amount of 0.5 to 10% by mass based on the total amount of the adhesive, and resin fillers, and a mass ratio of the content of the epoxy resin to the content of the phenoxy resin is 0.01 to 5.

6. A manufacturing method for a semiconductor device, wherein connection portions of a semiconductor chip are electrically connected to connection portions of a wiring circuit substrate or connection portions of a plurality of semiconductor chips are electrically connected to each other,

the method comprising a step of sealing at least part of the connection portions with the adhesive for a semiconductor according to claim 1 .

7. A semiconductor device prepared by the manufacturing method according to claim 6 .

8. The adhesive for a semiconductor according to claim 1 , wherein the adhesive has an insulation property.

9. The fluxing agent according to claim 5 , wherein the adhesive has an insulation property.

10. A fluxing agent, comprising at least one compound selected from a group consisting of methylsuccinic acid, 2-methyiglutaric acid, 2-methyladipic acid, 2-methylpimelic acid, and 2-methylsuberic acid, wherein the fluxing agent is configured to be blended in an adhesive for a semiconductor such that the adhesive comprises an epoxy resin in an amount of 5 to 75% by mass based on the total amount of the adhesive, a curing agent, a phenoxy resin, the fluxing agent in an amount of 0.5 to 10% by mass based on the total amount of the adhesive, and resin fillers, and a mass ratio of the content of the epoxy resin to the content of the phenoxy resin is 0.01 to 5.

11. The adhesive for a semiconductor according to claim 1 , wherein the resin fillers comprise at least one selected from the group consisting of a polyurethane resin and a polyimide resin.

12. The fluxing agent according to claim 5 , wherein the resin fillers comprise at least one selected from the group consisting of a polyurethane resin and a polyimide resin.

13. The fluxing agent according to claim 10 , wherein the resin fillers comprise at least one selected from the group consisting of a polyurethane resin and a polyimide resin.

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
CHANGE OF NAME Recorded Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 23, 2014
From: HONDA, KAZUTAKA; NAGAI, AKIRA; SATOU, MAKOTO
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 033799/0149 →