Method for stabilizing a plasma and an improved ionization chamber
A method for stabilizing a plasma is disclosed. The method includes (a) providing in an ionization chamber a number of high voltage wires and a gas suitable for forming a plasma, and (b) exposing the gas to a high voltage thereby igniting the gas to form the plasma. Upon ignition, the plasma is subjected to an amount of light. A use of the method to generate X-rays is also disclosed. The invention is further directed to an ionization chamber including (a) a gas suitable for forming a plasma, and (b) a number of high voltage wires for exposing the gas to a high voltage thereby igniting the gas to form the plasma. The ionization chamber includes a device for subjecting the plasma upon ignition to an amount of light. The invention relates to an X-ray generator including such ionization chamber and to a laser apparatus including such X-ray generator.
1. A method for stabilizing a plasma comprising:
(a) providing in an ionization chamber, a number of high voltage wires and a gas suitable for forming a plasma; and
(b) exposing the gas to a high voltage thereby igniting the gas to form the plasma,
wherein upon ignition, the plasma is subjected to an amount of light having a radiation energy from 100 mW to 1500 mW.
2. The method according to claim 1 , wherein the light has a wavelength between 10 and 1100 nanometers.
3. The method according to claim 1 , wherein the light is continuous.
4. The method according to claim 3 , wherein the light is substantially directed into the ionization chamber as a whole.
5. The method according to claim 1 , further comprising the step of C using X-rays generated after exposing the gas to the light.
6. The method of claim 2 , wherein the light is continuous while subjecting the plasma to the light.
7. An ionization chamber comprising:
(a) a gas suitable for forming a plasma; and
(b) a number of high voltage wires for exposing the gas to a high voltage thereby igniting the gas to form the plasma,
wherein the ionization chamber comprises a device for subjecting the plasma upon ignition to an amount of light, having a radiation energy from 100 mW to 1500 mW.
8. The ionization chamber according to claim 7 , wherein the device for subjecting the plasma to an amount of light comprises a light source with a wavelength between 10 and 1100 nanometers.
9. The ionization chamber according to claim 8 , wherein the device for subjecting the plasma to an amount of light comprises a continuous light source.
10. The ionization chamber according to claim 7 , wherein the device for subjecting the plasma to an amount of light is adapted for directing light substantially into the ionization chamber as a whole.
11. The ionization chamber according to claim 10 , wherein the device for subjecting the plasma to an amount of light comprises one or a plurality of external light sources and optical waveguides for guiding the light into the ionization chamber.
12. The ionization chamber according to claim 11 , wherein the optical waveguides comprise optical fibers.
13. A laser apparatus comprising an ionization chamber comprising:
(a) a gas suitable for forming a plasma; and
(b) a number of high voltage wires for exposing the gas to a high voltage thereby igniting the gas to form the plasma,
wherein the ionization chamber comprises a device for subjecting the plasma upon ignition to an amount of light with radiation energy from 100 mW to 1500 mW, said device comprising a light source having the radiation energy from 100 mW to 1500 mW.
14. The laser apparatus according to claim 13 comprising an X-ray generator.
15. The laser apparatus according to claim 13 , wherein the light is continuous.
16. The laser apparatus according to claim 13 , wherein the light is substantially directed into the ionization chamber as a whole.
17. The laser apparatus of claim 13 , wherein the light source is a continuous light source that provides continuous light at the radiation energy from 100 mW to 1500 mW.
18. The ionization chamber of claim 13 , wherein the light source is a continuous light source that provides continuous light at the radiation energy from 100 mW to 1500 mW.