Gel with self-restorability and shape-memory property and process for producing same
The present invention provides a gel formed by a host-guest interaction and having self-healing and shape-memory properties, and a process for producing the gel. A monomer containing a host group, a monomer containing a guest group, and an acrylic type monomer were dissolved in an aqueous solvent, and these monomers were subsequently copolymerized to produce a gel obtained from these monomers.
1. A process for producing an aqueous solvent solution containing a host group-containing monomer, a guest group-containing monomer, and an acrylic monomer, the process comprising the steps of mixing the host group-containing monomer, the guest group-containing monomer, and the acrylic monomer in an aqueous solvent, and heating the mixture obtained in the above step at 40 to 80° C. in the absence of a polymerization initiator to obtain an aqueous solvent solution of the monomers,
wherein the host group is at least one member selected from the group consisting of α-cyclodextrin, β-cyclodextrin, and γ-cyclodextrin, and
the host group of the host group-containing monomer and the guest group of the guest group-containing monomer form an inclusion complex.
2. The process according to claim 1 , wherein the host group-containing monomer is a monomer represented by formula (1)
wherein Q is O or NH, CD is α-cyclodextrin, β-cyclodextrin, or γ-cyclodextrin, and R a is a hydrogen atom or a methyl group.
3. The process according to claim 1 , wherein the guest group-containing monomer is a monomer represented by formula (2)
wherein A is an optionally substituted aryl group, C(O)OR1, or C(O)NHR1, R1 is an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted arylalkyl group, and R b is a hydrogen atom or a methyl group.
4. The process according to claim 1 , wherein the acrylic monomer is a monomer represented by formula (3)
wherein X is OR2 or NH2, R2 is a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted aryl group, and R c is a hydrogen atom or a methyl group.
5. The process according to claim 1 , wherein the host group-containing monomer is used in an amount of 30 to 0.5 mol %, the guest group-containing monomer is used in an amount of 30 to 0.5 mol %, and the acrylic monomer is used in an amount of 40 to 99mol %.
6. The process according to claim 1 , wherein the aqueous solvent is water or a mixed solvent of water and an organic solvent compatible with water.
7. A process for producing a gel, comprising the process for producing an aqueous solvent solution containing a host group-containing monomer, a guest group-containing monomer, and an acrylic monomer according to claim 1 and copolymerizing the host group-containing monomer, the guest group-containing monomer, and the acrylic monomer to produce a gel.
8. The process according to claim 2 , wherein the guest group-containing monomer is a monomer represented by formula (2)
wherein A is an optionally substituted aryl group, C(O)OR1, or C(O)NHR1, R1 is an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted arylalkyl group, and R b is a hydrogen atom or a methyl group.
9. The process according to claim 2 , wherein the acrylic monomer is a monomer represented by formula (3)
wherein X is OR2 or NH2, R2 is a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted aryl group, and R c is a hydrogen atom or a methyl group.
10. The process according to claim 3 , wherein the acrylic monomer is a monomer represented by formula (3)
wherein X is OR2 or NH2, R2 is a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted aryl group, and R c is a hydrogen atom or a methyl group.
11. The process according to claim 2 , wherein the host group containing monomer is used in an amount of 30 to 0.5 mol %, the guest group-containing monomer is used in an amount of 30 to 0.5 mol %, and the acrylic monomer is used in an amount of 40 to 99mol %.
12. The process according to claim 3 , wherein the host group-containing monomer is used in an amount of 30 to 0.5 mol %, the guest group-containing monomer is used in an amount of 30 to 0.5 mol %, and the acrylic monomer is used in an amount of 40 to 99mol %.
13. The process according to claim 4 , wherein the host group-containing monomer is used in an amount of 30 to 0.5 mol %, the guest group-containing monomer is used in an amount of 30 to 0.5 mol %, and the acrylic monomer is used in an amount of 40 to 99 mol %.
14. The process according to claim 2 , wherein the aqueous solvent is water or a mixed solvent of water and an organic solvent compatible with water.
15. The process according to claim 3 , wherein the aqueous solvent is water or a mixed solvent of water and an organic solvent compatible with water.
16. The process according to claim 4 , wherein the aqueous solvent is water or a mixed solvent of water and an organic solvent compatible with water.
17. The process according to claim 1 , wherein the guest group-containing monomer is a monomer represented by formula (2)
wherein A is an optionally substituted aryl group, C(O)OR1, or C(O)NHR1, R1 is an optionally substituted alkyl group, an optionally substituted aryl group, and the alkyl group is selected from a group consisting of n-butyl, isobutyl, sec-butyl, tert-butyl, pentyl, cyclopentyl, hexyl, cyclohexyl, isohexyl, dodecyl, octadecyl, and adamantly, and the aryl group is selected from a group consisting of phenyl, toluoyl, xylyl, naphthyl, anthryl, and phenanthryl; the acrylic monomer is different from the host group-containing monomer and the guest group-containing monomer; and R b is a hydrogen atom or a methyl group.