Packaged semiconductor device, a semiconductor device and a method of manufacturing a packaged semiconductor device
A packaged semiconductor device comprising a package and a semiconductor device is described. The semiconductor device comprises a first and a second GND-pad bonded to one or more GND-pins with a first and a second bond wire respectively, a first functional pad bonded to a first functional pin with a third bond wire, a semiconductor layer of a P-type conductivity, a first semiconductor component and a second semiconductor component. The first semiconductor component is arranged to, when a transient current is applied to the first functional pin, divert at least part of the transient current to the first GND-pad from the first P-region to the first GND-pad via at least a first PN-junction. The second semiconductor component comprises a second N-type region of a terminal of the second semiconductor component associated with the first functional pad. The first GND-pad is in contact with a second P-type region. The second GND-pad is in contact with a third N-type region. At least part of the second P-type region is arranged in between the first semiconductor component and the second semiconductor component, and at least part of the third N-type region is arranged in between the at least part of the first P-type region and the second semiconductor component.
1. A packaged semiconductor device comprising a package and a semiconductor device, the semiconductor device comprising:
a first GND-pad and a second GND-pad bonded to one or more GND-pins of the package with a first bond wire and a second bond wire respectively;
a first functional pad bonded to a first functional pin of the package with a third bond wire;
a semiconductor layer of a P-type conductivity;
a first semiconductor component formed in the semiconductor layer, the first semiconductor component comprising a first P-type region and a first N-type region, the first functional pad being in contact with the first P-type region, the first N-type region isolating the first P-type region from the semiconductor layer, and the first semiconductor component being arranged to, when a transient current is applied to the first functional pin, divert at least part of the transient current applied to the first functional pin to the first GND-pad from the first P-region to the first GND-pad via at least a first PN-junction;
a second semiconductor component formed in the semiconductor layer, the second semiconductor component comprising a second N-type region of a terminal of the second semiconductor component associated with the first functional pad;
a second P-type region formed in the semiconductor layer, the first GND-pad being in contact with the second P-type region, the second P-type region being isolated from first N-type region of the first semiconductor component;
a third N-type region formed in the semiconductor layer, the second GND-pad being in contact with the third N-type region, the third N-type region being isolated from the first semiconductor component, the second semiconductor component and the second P-type region;
at least part of the second P-type region being arranged in between the first semiconductor component and the second semiconductor component; and
at least part of the third N-type region being arranged in between the at least part of the first P-type region and the second semiconductor component.
2. A packaged semiconductor device according to claim 1 , wherein the first P-type region is formed in the first N-type region, and the first PN-junction is formed by the first P-type region and the first N-type region.
3. A packaged semiconductor device according to claim 1 , wherein the first P-type region is formed in the first N-type region, a first further P-type region is formed in the first N-type region, and the first PN-junction is formed by the first P-type region and the first N-type region, the first N-type region isolating the first further P-region from the semiconductor layer and from the first P-type region, and the first PN-junction is formed by the first P-type region and the first N-type region as part of a PNP-transistor formed by the first P-type region, the first N-type region and the first further P-type region.
4. A packaged semiconductor device according to claim 1 , wherein the first semiconductor component comprises a second further P-type region and a further N-type region, the further N-type region isolating the second further P-region from the first P-region, the first N-type region isolating the second further P-region from the semiconductor layer, the first PN-junction being formed by the first P-type region and the further N-type region as part of a PNP-transistor formed by the first P-type region, the further N-type region and the second further P-type region.
5. A packaged semiconductor device according to claim 1 , the second P-type region being I-shaped.
6. A packaged semiconductor device according to claim 1 , the second P-type region at least partly surrounding the first semiconductor component.
7. A packaged semiconductor device according to claim 6 , the second P-type region being ring-shaped and surrounding the first semiconductor component.
8. A packaged semiconductor device according to claim 6 , the second P-type region being U-shaped.
9. A packaged semiconductor device according to claim 1 , the third N-type region being I-shaped, U-shaped or ring-shaped.
10. A packaged semiconductor device according to claim 1 , the first N-type region extending from the surface of the semiconductor layer.
11. A packaged semiconductor device according to claim 1 , the first N-type region being at least a part of an N-type buried layer.
12. A packaged semiconductor device according to claim 11 , comprising a trench between the second P-type region and the first semiconductor component, the trench isolating the second P-type region from the at least part of the first N-type buried layer.
13. A packaged semiconductor device according to claim 1 , the semiconductor layer being a P-type epitaxial layer formed over a semiconductor substrate.
14. A packaged semiconductor device according to claim 1 , the semiconductor layer being a semiconductor substrate.
15. A packaged semiconductor device according to claim 1 , the first GND-pad being bonded with the first bond wire to a first GND-pin of the one or more GND-pins of the package and the second GND-pad being bonded with the second bond wire to a second GND-pin of the one or more GND-pins of the package.
16. A packaged semiconductor device according to claim 1 , the first GND-pad and the second GND-pad being bonded to the same GND-pin of the one or more GND-pins of the package with the first bond wire and the second bond wire respectively.
17. A packaged semiconductor device according to claim 1 , wherein the first functional pad corresponds to a supply pad.
18. A packaged semiconductor device according to claim 1 , wherein the first functional pad corresponds to an interface pad.
19. A semiconductor device comprising:
a first GND-pad and a second GND-pad bonded to one or more GND-pins of the package with a first bond wire and a second bond wire respectively;
a first functional pad bonded to a first functional in of the package with a third bond wire;
a semiconductor layer of a P-type conductivity;
a first semiconductor component formed in the semiconductor layer, the first semiconductor component comprising a first P-type region and a first N-type region, the first functional pad being in contact with the first P-type region, the first N-type region isolating the first P-type region from the semiconductor layer, and the first semiconductor component being arranged to, when a transient current is applied to the first functional pin, divert at least part of the transient current applied to the first functional in to the first GND-pad from the first P-region to the first GND-pad via at least a first PN-junction;
a second semiconductor component formed in the semiconductor layer, the second semiconductor component comprising a second N-type region of a terminal of the second semiconductor component associated with the first functional pad;
a second P-type region formed in the semiconductor layer, the first GND-pad being in contact with the second P-type region, the second P-type region being isolated from first N-type region of the first semiconductor component;
a third N-type region formed in the semiconductor layer, the second GND-pad being in contact with the third N-type region, the third N-type region being isolated from the first semiconductor component, the second semiconductor component and the second P-type region;
at least part of the second P-type region being arranged in between the first semiconductor component and the second semiconductor component; and
at least part of the third N-type region being arranged in between the at least part of the first P-type region and the second semiconductor component.
20. A semiconductor device according to claim 19 , wherein the first P-type region is formed in the first N-type region, and the first PN-junction is formed by the first P-type region and the first N-type region.