Pattern inspection device and pattern inspection method
View Patent ↗Provided is a pattern inspection device for accurately simulating an electron beam image of a circuit pattern on a wafer from design data, and implementing high-precision defect detection based on the comparison between the simulated electron beam image and a real image. A pattern inspection device comprises: an image capturing unit for capturing an electron beam image of a pattern formed on a substrate; a simulated electron beam image generation unit for generating a simulated electron beam image using a parameter indicating the characteristics of the electron beam image on the basis of design data; and an inspection unit for comparing the electron beam image of the pattern, which is the image captured by the image capturing unit, and the simulated electron beam image generated by the simulated electron beam image generation unit, and inspecting the pattern on the substrate.
1. A pattern inspection device comprising:
an imaging unit that images an electron beam image of a pattern formed on a substrate;
a simulated electron beam image generation unit that generates a simulated electron beam image using a parameter based on design data, the parameter representing a characteristic of the electron beam image; and
an inspection unit that inspects the pattern on the substrate by comparing the electron beam image of the pattern and the simulated electron beam image, the electron beam image of the pattern being imaged by said imaging unit, the simulated electron beam image being generated by said simulated electron beam image generation unit.
2. A pattern inspection device comprising:
an imaging unit that images an electron beam image of a pattern formed on a substrate;
a pattern shape transformation unit that transforms a shape of the pattern using a parameter based on design data, the parameter representing a processing characteristic of the pattern;
a simulated electron beam image generation unit that generates a simulated electron beam image for the pattern using a parameter, the pattern being transformed by said pattern shape transformation unit, the parameter representing a characteristic of the electron beam image; and
an inspection unit that inspects the pattern on the substrate by comparing the electron beam image of the pattern and the simulated electron beam image, the electron beam image of the pattern being imaged by said imaging unit, the simulated electron beam image being generated by said simulated electron beam image generation unit.
3. The pattern inspection device according to claim 1 , further comprising:
a condition input unit that automatically determines a parameter value, necessary for generating the simulated electron beam image, from the design data; and
a parameter calculation unit.
4. The pattern inspection device according to claim 1 wherein
the parameter representing the characteristic of the electron beam image, generated by said simulated electron beam image generation unit, include at least one of a brightness of a pattern portion, a brightness of a background portion, a brightness of an edge portion for each direction, and a blur amount of the edge portion.
5. The pattern inspection device according to claim 2 , further comprising:
a variation range setting unit that sets a variation range for a parameter representing an exposure characteristic; and
a transformation pattern generation unit that generates a plurality of transformation patterns each corresponding to the variation range that is set by said variation range setting unit, wherein
said simulated electron beam image generation unit generates a plurality of simulated electron beam images corresponding to the plurality of transformation patterns generated by said transformation pattern generation unit, and
said inspection unit produces a plurality of inspection results linked to the parameter representing the exposure characteristic by comparing the electron beam image of the pattern and the plurality of simulated electron beam images, the electron beam image of the pattern being imaged by said imaging unit, the plurality of simulated electron beam images being generated by said simulated electron beam image generation unit.
6. The pattern inspection device according to claim 1 , further comprising:
a variation range setting unit that sets a variation range for the parameter representing the characteristic of the electron beam image wherein
said simulated electron beam image generation unit generates a plurality of simulated electron beam images, corresponding to the variation range, for the parameter representing the characteristic of the electron beam image that is set by said variation range setting unit, and
said inspection unit produces a plurality of inspection results linked to the parameter representing the characteristic of the electron beam image by comparing the electron beam image of the pattern and the plurality of simulated electron beam images, the electron beam image of the pattern being imaged by said imaging unit, the plurality of simulated electron beam images being generated by said simulated electron beam image generation unit.
7. The pattern inspection device according to claim 5 wherein
said variation range setting unit updates a value of the parameter representing the characteristic of the electron beam image based on a temporal transition of the plurality of inspection results that are linked to the parameter representing the characteristic of the electron beam image.
8. The pattern inspection device according to claim 1 , further comprising:
a brightness adjustment unit that adjusts brightness between the electron beam image of the pattern and the simulated electron beam image; and
a brightness adjustment parameter storage unit that stores a brightness adjustment parameter between the electron beam image of the pattern and the simulated electron beam image.
9. The pattern inspection device according to claim 8 wherein
said brightness adjustment parameter storage unit updates a value of the brightness adjustment parameter based on a temporal transition of the stored brightness adjustment parameter.
10. A pattern inspection method comprising:
an imaging step for imaging an electron beam image of a pattern formed on a substrate;
a simulated electron beam image generation step for generating a simulated electron beam image using a parameter based on design data, the parameter representing a characteristic of the electron beam image; and
an inspection step for inspecting the pattern on the substrate by comparing the electron beam image of the pattern and the simulated electron beam image, the electron beam image of the pattern being imaged by said imaging step, the simulated electron beam image being generated by said simulated electron beam image generation step.
11. A pattern inspection method comprising:
an imaging step for imaging an electron beam image of a pattern formed on a substrate;
a pattern shape transformation step for transforming a shape of the pattern using a parameter based on design data, the parameter representing a processing characteristic of the pattern;
a simulated electron beam image generation step for generating a simulated electron beam image for the pattern using a parameter, the pattern being transformed by said pattern shape transformation step, the parameter representing a characteristic of the electron beam image; and
an inspection step for inspecting the pattern on the substrate by comparing the electron beam image of the pattern and the simulated electron beam image, the electron beam image of the pattern being imaged by said imaging step, the simulated electron beam image being generated by said simulated electron beam image generation step.
12. The pattern inspection method according to claim 10 , further comprising:
a condition input step for automatically determining a parameter value, necessary for generating the simulated electron beam image, from the design data; and
a parameter calculation step.
13. The pattern inspection method according to claim 10 wherein
the parameter representing the characteristic of the electron beam image, generated by said simulated electron beam image generation step, include at least one of a brightness of a pattern portion, a brightness of a background portion, a brightness of an edge portion for each direction, and a blur amount of the edge portion.
14. The pattern inspection method according to claim 11 , further comprising:
a variation range setting step for setting a variation range for a parameter representing an exposure characteristic; and
a transformation pattern generation step for generating a plurality of transformation patterns each corresponding to the variation range that is set by said variation range setting step, wherein
said simulated electron beam image generation step generates a plurality of simulated electron beam images corresponding to the plurality of transformation patterns generated by said transformation pattern generation step, and
said inspection step produces a plurality of inspection results linked to the parameter representing the exposure characteristic by comparing the electron beam image of the pattern and the plurality of simulated electron beam images, the electron beam image of the pattern being imaged by said imaging step, the plurality of simulated electron beam images being generated by said simulated electron beam image generation step.
15. The pattern inspection method according to claim 10 , further comprising:
a variation range setting step for setting a variation range for the parameter representing the characteristic of the electron beam image wherein
said simulated electron beam image generation step generates a plurality of simulated electron beam images, corresponding to the variation range, for the parameter representing the characteristic of the electron beam image that is set by said variation range setting step, and
said inspection step produces a plurality of inspection results linked to the parameter representing the characteristic of the electron beam image by comparing the electron beam image of the pattern and the plurality of simulated electron beam images, the electron beam image of the pattern being imaged by said imaging step, the plurality of simulated electron beam images being generated by said simulated electron beam image generation step.
16. The pattern inspection method according to claim 14 wherein
said variation range setting step updates a value of the parameter representing the characteristic of the electron beam image based on a temporal transition of the plurality of inspection results that are linked to the parameter representing the characteristic of the electron beam image.
17. The pattern inspection method according to claim 10 , further comprising:
a brightness adjustment step for adjusting brightness between the electron beam image of the pattern and the simulated electron beam image; and
a brightness adjustment parameter storage step for storing a brightness adjustment parameter between the electron beam image of the pattern and the simulated electron beam image.
18. The pattern inspection method according to claim 17 wherein
said brightness adjustment parameter storage step updates a value of the brightness adjustment parameter based on a temporal transition of the stored brightness adjustment parameter.