IP Library Granted Patent US 9,586,183
Granted Patent B2
US 9,586,183 · App. 14/408,737 · Granted Mar 7, 2017

Membranes

Inventor: Petrus Van Kessel (Tilburg, NL)
Assignee: Fujifilm Manufacturing Europe BV
B01D71/70B01D53/228B01D69/10B01D69/127B01D71/022B01D71/024B01D71/16B01D71/52B01D71/64B01D2313/44B01D2323/30
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Quick Facts
Patent No.
US 9,586,183
App. No.
14/408,737
Granted
Mar 7, 2017
Kind
B2
Abstract

A composite membrane comprising: a. a porous support; b. a polymeric layer comprising dialkylsiloxane groups and a metal, the polymeric layer being present on the porous support; c. a discriminating layer present on the polymeric layer; and d. optionally a protective layer present on the discriminating layer wherein the polymeric layer has a molar ratio of metal:silicon of at least 0.0005.

Claims (40)

1. A composite membrane comprising:

a. a porous support; and

b. a polymeric layer comprising dialkylsiloxane groups and a metal, the polymeric layer being present on the porous support;

c. a discriminating layer present on the polymeric layer; and

d. optionally a protective layer present on the discriminating layer

wherein the polymeric layer has a molar ratio of metal:silicon of at least 0.0005.

2. The membrane according to claim 1 , wherein the metal is derived from a metal complex.

3. The membrane according to claim 1 , wherein the metal is selected from any one of groups 4 and 5 of the periodic table.

4. The membrane according to claim 1 , wherein the metal is titanium, zirconium, hafnium, vanadium or niobium.

5. The membrane according to claim 1 , wherein the discriminating layer comprises a polyimide comprising trifluoromethyl groups.

6. The membrane according to claim 1 , wherein the average thickness of the discriminating layer is 20 nm to 2 μm and the polymeric layer has an average thickness of 25 to 1200 nm.

7. The membrane according to claim 1 , wherein the porous support has surface pores of average diameter 0.001 to 0.1 μm.

8. The composite membrane according to claim 1 which is a composite gas separation membrane.

9. A gas separation cartridge comprising a composite membrane according to claim 1 .

10. The composite membrane according to claim 1 wherein:

(a) the metal is derived from a metal complex;

(b) the metal is selected from any one of groups 4 and 5 of the periodic table;

(c) the discriminating layer comprises a polyimide comprising trifluoromethyl groups;

(d) average thickness of the discriminating layer is 20 nm to 2 μm; and

(e) the polymeric layer has an average thickness 25 to 1200 nm.

11. The composite membrane according to claim 10 which is a composite gas separation membrane.

12. The composite membrane according to claim 1 which is a composite gas separation membrane and has a pure water permeability at 20° C. of less than 6.10-8 m3/m2·s·kPa.

13. The composite membrane according to claim 10 which is a composite gas separation membrane and has a pure water permeability at 20° C. of less than 6.10-8 m3/m2·s·kPa.

14. A gas separation cartridge comprising a composite membrane according to claim 4 .

15. A gas separation cartridge comprising a composite membrane according to claim 6 .

16. A gas separation cartridge comprising a composite membrane according to claim 10 .

17. A process for preparing a composite membrane comprising the steps:

(i) applying to a porous support a radiation-curable composition comprising a polymerisable dialkylsiloxane and a metal;

(ii) irradiating the radiation-curable composition on the support, thereby forming a polymeric layer comprising dialkylsiloxane groups and a metal on the porous support;

(iii) forming a discriminating layer on the polymeric layer; and

(iv) optionally forming a protective layer on the discriminating layer;

wherein the polymeric layer has a molar ratio of metal:silicon of at least 0.0005.

18. The process according to claim 17 wherein the radiation-curable composition comprises a metal complex and a polymerisable poly(dialkylsiloxane).

19. The process according to claim 17 which further comprises the step of forming a protective layer on the discriminating layer (step (iv)).

20. The process according to claim 19 wherein:

(a) the metal is derived from a metal complex;

(b) the metal is selected from any one of groups 4 and 5 of the periodic table;

(c) the discriminating layer comprises a polyimide comprising trifluoromethyl groups;

(d) average thickness of the discriminating layer is 20 nm to 2 μm; and

(e) the polymeric layer has an average thickness 25 to 1200 nm.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 17, 2026
From: YESTAR ADVANCED MATERIALS (HK) CO., LIMITED
To: YESTAR ADVANCED MATERIALS (SUZHOU) CO., LTD.
Reel/Frame 076045/0973 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 29, 2026
From: FUJIFILM MANUFACTURING EUROPE B.V.
To: YESTAR ADVANCED MATERIALS (HK) CO., LIMITED
Reel/Frame 075440/0651 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 27, 2015
From: VAN KESSEL, PETRUS
To: FUJIFILM MANUFACTURING EUROPE B.V.
Reel/Frame 035274/0468 →
Priority Claims (2)
GB 1211309.8 · Jun 26, 2012 · national
GB 1219665.5 · Nov 1, 2012 · national
Continuity (1)
Related Publication 20150190762A1 · Jul 9, 2015