IP Library Patent Application 14409399
Patent Application
App. No. 14/409,399

PLASMA EQUIPMENT FOR TREATING POWDER

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Patent No.
US None
App. No.
14/409,399
Abstract

A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a circular surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the circular surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the circular surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the circular surface discharge plasma module.

Claims (12)

1 - 7 . (canceled)

8 . A powder plasma processing apparatus of a cylindrical surface discharge plasma module, the apparatus comprising:

a plate-like electrode layer serving as an external surface of the cylindrical surface discharge plasma module;

an insulating layer disposed on an internal surface of the plate-like electrode layer; and

a plasma generating electrode disposed on the insulating layer,

wherein the cylindrical surface discharge plasma module is configured to rotate, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the cylindrical surface discharge plasma module,

wherein the apparatus comprises a driving unit configured to rotate the cylindrical surface discharge plasma module while the cylindrical surface discharge plasma module is in a horizontal state.

9 . The powder plasma processing apparatus of claim 8 , wherein a high voltage is applied to the plate-like electrode layer, and the plasma generating electrode is a ground electrode.

10 . The powder plasma processing apparatus of claim 8 , wherein a high voltage is applied to the plasma generating electrode, and the plate-like electrode layer is a ground electrode.

11 . The powder plasma processing apparatus of claim 8 , wherein a plurality of the plasma generating electrodes are arranged on the insulating layer at intervals in the circumferential direction of the surface discharge plasma module, and extend in the longitudinal direction of the surface discharge plasma module.

12 . The powder plasma processing apparatus of claim 8 , wherein a plurality of the plasma generating electrodes are arranged on the insulating layer at intervals in the longitudinal direction of the surface discharge plasma module, and extend in the circumferential direction of the surface discharge plasma module.

13 . The powder plasma processing apparatus of claim 12 , wherein the driving unit includes a rotational speed control unit configured to control the speed at which the driving unit rotates the cylindrical surface discharge plasma module.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 18, 2014
From: SEOK, DONG CHAN; JUNG, YONG HO; JEONG, HYUN YOUNG
To: KOREA BASIC SCIENCE INSTITUTE
Reel/Frame 034551/0625 →