IP Library Granted Patent US 9,527,058
Granted Patent B2
US 9,527,058 · App. 14/423,045 · Granted Dec 27, 2016

Continuous processing device

Inventors: Yo Doya (Tokyo, JP); Hidenori Goto (Tokyo, JP)
Assignee: TSUKISHIMA KIKAI CO., LTD.
B01J19/24B01F3/0853B01F3/0865B01F5/0065B01F5/0071B01F5/10B01F7/18B01F13/1016B01F13/1022B01F15/065B01J19/1862B01J19/242B01J19/2405B01J19/2435C01G53/006B01J2219/2401C01P2004/03
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Quick Facts
Patent No.
US 9,527,058
App. No.
14/423,045
Granted
Dec 27, 2016
Kind
B2
Abstract

To provide a processing device which is small but which can exhibits a sufficient processing amount and a uniform contact processing property. In the processing vessel 10 , a liquid flow is set to a spiral flow, and in a contact processing field, the injection liquid A, B are injected at a center-side position with respect to an inner surface of the processing vessel so as to perform contact processing.

Claims (25)

1. A continuous reaction processing device for inorganic particles including: a reactor having a first end portion, a second end portion, and an inner surface; an injecting unit for injecting a reaction liquid containing an inorganic substance into the reactor; and a circulating unit for continuously introducing a contact processing liquid discharged from the second end portion of the reactor into a circulation flow path and returning at least a part of the contact processing liquid to become a returned processing liquid flowing into the circulation flow path to the first end portion of the reactor;

wherein the circulating unit causes the returned processing liquid to flow along the inner surface of the reactor to generate a spiral flow inside the reactor;

wherein the injecting unit injects the reaction liquid having a injection direction from the first end portion to the second end portion at a position closer to the second end portion than to an inflow position for the returned processing liquid into the reactor, and closer to a central axis of the reactor than to the inner surface of the reactor;

wherein the injected reaction liquid comes into contact with the spiral flow of the contact processing liquid inside the reactor, and the contact processing liquid is discharged from the second end portion of the reactor; and

wherein the injecting unit fails to inject gas into the reactor.

2. The continuous reaction processing device for inorganic particles according to claim 1 , wherein the inner surface of the reactor is tapered from the first end portion to the second end portion and the inflow position for the returned processing liquid is the first end portion of the reactor in a longitudinal direction.

3. The continuous reaction processing device for inorganic particles according to claim 1 , comprising the reactor through which the contact processing liquid is circulated, wherein

midway in the circulating, an external reactor is provided, which has a stirring blade and a different structure from that of the reactor,

a part of the contact processing liquid is extracted outside from the reactor so as to be sent to the external reactor where the contact processing liquid is processed, and

the contact processing liquid is returned to the reactor.

4. The continuous reaction processing device for inorganic particles according to claim 1 , comprising the reactor through which the contact processing liquid is circulated, wherein

midway in the circulating, two external tanks are provided in series,

a downstream-side external tank is an external sedimentation separation tank, to which the reaction liquid is not injected, and in which sedimentation and separation are performed, and

only a group of fine particles in an upper portion of the external sedimentation separation tank is returned to the reactor.

5. The continuous reaction processing device for inorganic particles according to claim 1 , comprising the reactor through which the contact processing liquid is circulated, wherein

midway in the circulating, an external sedimentation separation tank, to which the reaction liquid is not injected, and in which solid-liquid separation, separation of particles according to size or gas separation is performed, and

only a group of fine particles in an upper portion of the external sedimentation separation tank or only a gas separated liquid is returned to the reactor.

6. The continuous reaction processing device for inorganic particles according to claim 1 , the device comprising a main body block, the main body block having a space formed therein, and the reactor being formed in the space.

7. The continuous reaction processing for inorganic particles device according to claim 1 , the device comprising a main body block, the main body block having a space formed therein, and plural reactors being formed in parallel in the space.

8. The continuous reaction processing device for inorganic particles according to claim 1 , wherein a space is formed in a main body block and the reactor, an extraction path through which the contact processing liquid is extracted, and a return path through which the contact processing liquid is returned, are respectively formed in the space.

9. The continuous reaction processing device for inorganic particles according to claim 6 , wherein the main body block is made of a transparent or semitransparent material.

10. The continuous reaction processing device for inorganic particles according to claim 1 , wherein the reactor, the injecting unit, and the circulating unit form a unitary device, and a plurality of these unitary devices are arranged mutually.

11. The continuous reaction processing device for inorganic particles according to claim 1 , wherein the injecting unit is configured to inject the reaction liquid into the reactor through a check valve.

12. The continuous reaction processing device for inorganic particles according to claim 1 , wherein midway in a circulating path, a heating unit or cooling unit for the contact processing liquid is included.

13. The continuous reaction processing device for inorganic particles according to claim 1 , wherein the reaction liquid is injected via a plurality of injection tubes arranged in parallel with each other from the first end portion to the second end portion.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 24, 2025
From: TSUKISHIMA HOLDINGS CO.,LTD.
To: TSUKISHIMA KIKAI CO.,LTD.
Reel/Frame 070301/0675 →
CHANGE OF NAME Recorded Feb 19, 2025
From: TSUKISHIMA KIKAI CO.,LTD.
To: TSUKISHIMA HOLDINGS CO.,LTD.
Reel/Frame 070255/0308 →
CORRECTIVE ASSIGNMENT TO CORRECT THE APPLICATION NUMBER FROM "14/423,025" TO --14/423,045-- PREVIOUSLY RECORDED ON REEL 035027 FRAME 0642. ASSIGNOR(S) HEREBY CONFIRMS THE APPLICATION NUMBER TO BE 14/423,045. Recorded Mar 12, 2015
From: DOYA, YO; GOTO, HIDENORI
To: TSUKISHIMA KIKAI CO., LTD.
Reel/Frame 035197/0418 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 25, 2015
From: DOYA, YO; GOTO, HIDENORI
To: TSUKISHIMA KIKAI CO., LTD.
Reel/Frame 035027/0642 →
Priority Claims (1)
JP 2012-187292 · Aug 28, 2012 · national
Continuity (1)
Related Publication 20150217264A1 · Aug 6, 2015