Drum sputtering device
View Patent ↗A drum sputtering device that can uniformly deposit target atoms on all over particles is provided. The drum sputtering device includes a vacuum container 2 that contains particles, a tubular drum 10 that is arranged inside the vacuum container 2 and at least one end face 10 c of which is open, and a sputtering target 16 that is arranged inside the drum 10 . With a supporting arm 11 , a drive motor 12 for rotation, a drive motor 13 for swing, a first gear member 14 , and a second gear member 15 , the drum can be rotated around the axis of the drum 10 and the drum 10 can be swung so that one end portion 10 e and the other end portion 10 f in the axial direction of the drum 10 are relatively vertically switched.
1. A drum sputtering device comprising:
a vacuum container;
a tubular drum arranged inside the vacuum container, having at least one end face open, and containing particles;
a sputtering target arranged inside the drum;
a rotation mechanism that rotates the drum around an axis of the drum; and
a swing mechanism that swings the drum independently of the rotation mechanism so that one end portion and the other end portion in an axial direction of the drum are relatively vertically switched,
wherein the drum is rotated by the rotation mechanism and also is swung by the swing mechanism.
2. The drum sputtering device according to claim 1 , wherein both end portions of the drum in the axial direction are constricted.
3. The drum sputtering device according to claim 1 , further comprising:
a particle supplying chamber that is connected to the vacuum container;
a first opening and closing device that opens and closes a space between the vacuum container and the particle supplying chamber;
a first vacuuming device that vacuums air in the particle supplying chamber; and
a first atmosphere releasing device that supplies air into the particle supplying chamber.
4. The drum sputtering device according to claim 1 , further comprising:
a particle recovering chamber that is connected to the vacuum container and is arranged below the drum;
a second opening and closing device that opens and closes a space between the vacuum container and the particle recovering chamber;
a second vacuuming device that vacuums air in the particle recovering chamber; and
a second atmosphere releasing device that supplies air into the particle recovering chamber.
5. The drum sputtering device according to claim 1 , further comprising:
an oxygen supplying device that supplies oxygen into the vacuum container.
6. A drum sputtering device comprising:
a vacuum container configured to contain particles;
a drum having a tubular shape arranged inside the vacuum container, having at least one end face open, and configured to contain particles;
an arm portion arranged inside the drum configured to hold a sputtering target;
a rotation mechanism that rotates the drum around an axis of the drum; and
a swing mechanism that swings the drum independently of the rotation mechanism among a horizontal position in which the axis of the drum is horizontal, a first inclined position in which the axis of the drum is inclined with respect to horizontal and in which the one end portion in an axial direction of the drum is higher than the other end portion in an axial direction of the drum, and a second inclined position in which the axis of the drum is inclined with respect to horizontal and in which the other end portion in an axial direction of the drum is higher than the one end portion in an axial direction of the drum,
wherein the drum is rotated by the rotation mechanism and also is swung by the swing mechanism.
7. The drum sputtering device according to claim 6 , wherein rotation mechanism rotates the drum around the arm portion arranged inside the drum.
8. The drum sputtering device according to claim 6 , wherein the swing mechanism swings the arm portion arranged inside the drum so that the sputtering target is configured to follow swing of the drum but not follow rotation of the drum around the axis of the drum.
9. The drum sputtering device according to claim 6 , wherein the swing mechanism that swings the drum repeatedly in order from the horizontal position to the first inclined position, to the horizontal position, to the second inclined position and to the horizontal position.
10. The drum sputtering device according to claim 6 , wherein the drum has a cylindrical shape.
11. The drum sputtering device according to claim 10 , wherein the one end portion and the other end portion of the drum in the axial direction are constricted.
12. The drum sputtering device according to claim 6 , wherein the drum has a polygonal tubular shape.
13. The drum sputtering device according to claim 12 , wherein the one end portion and the other end portion of the drum in the axial direction are constricted.
14. The drum sputtering device according to claim 6 , further comprising:
a particle supplying chamber that is connected to the vacuum container;
a first opening and closing device that opens and closes a space between the vacuum container and the particle supplying chamber;
a first vacuuming device that vacuums air in the particle supplying chamber; and
a first atmosphere releasing device that supplies air into the particle supplying chamber.
15. The drum sputtering device according to claim 6 , further comprising:
a particle recovering chamber that is connected to the vacuum container and is arranged below the drum;
a second opening and closing device that opens and closes a space between the vacuum container and the particle recovering chamber;
a second vacuuming device that vacuums air in the particle recovering chamber; and
a second atmosphere releasing device that supplies air into the particle recovering chamber.
16. The drum sputtering device according to claim 6 , further comprising:
an oxygen supplying device that supplies oxygen into the vacuum container.
17. The drum sputtering device according to claim 1 , further comprising an arm portion arranged inside the drum to hold the sputtering target, wherein the swing mechanism swings the arm portion arranged inside the drum so that the sputtering target is configured to follow swing of the drum but not follow rotation of the drum around the axis of the drum.