Horticulture lighting system and horticulture production facility using such horticulture lighting system

1. A lighting system comprising:

a lighting device comprising a plurality of light sources for application in a horticulture production facility comprising said lighting device, wherein the light sources are configured to illuminate with horticulture light, crops within the horticulture production facility;

wherein the lighting system further comprises a control unit which is configured to control a light intensity of local light at a location within the horticulture production facility, wherein the local light is a sum of the horticulture light and additional light at the location originating from a light source not comprised in the lighting device;

wherein the lighting system further comprises a sensor, configured to sense the photosynthetic photon flux density of the local light at the location;

wherein upon the sensor detecting a change in the photosynthetic photon flux density of the local light at the location, the control unit is configured to limit rate of the change by controlling the contribution of the horticulture light to the local light in a manner such that on average, the change of the photosynthetic photon flux density of the local light does not exceed 50 μmol/sec/m 2 over a predetermined period of time selected from a range of equal to or smaller than 5 minutes; and,

wherein the photosynthetic photon flux density of the local light is determined as a total number of photons within a wavelength range of 400-800 nm per second per unit area of a local light receiving area.

2. The lighting system according to claim 1 , wherein the control unit is configured to prevent a change in the photosynthetic photon flux density of the local light at the location within the horticulture production facility of, on average, more than 5 μmol/sec/m 2 over the predetermined period of time.

3. The lighting system according to claim 1 , wherein the predetermined period of time is selected from the range of equal to or smaller than 2 minutes.

4. The lighting system according to claim 3 , wherein the control unit is further configured to prevent a change in a spectral light distribution of the local light at the location by controlling the contribution of the horticulture light to the local light to such an extent, that a change in a ratio of intensities between two or more wavelength ranges within the wavelength range of 400-800 nm of the local light maintain within 1:2-2:1 of the intensity of a predetermined wavelength range selected out of the two or more wavelength ranges.

5. The lighting system according to claim 4 , wherein the control unit is configured to prevent a change in the photosynthetic photon flux density within the wavelength range of 300-800 nm of the local light at the location within the horticulture production facility of, on average, more than 20 μmol/sec/m 2 over the predetermined period of time.

6. The lighting system according to claim 1 , wherein the control unit is further configured to control one or more of the intensity and the spectral light distribution of the local light at the location as function of a predetermined light recipe by controlling the contribution of the horticulture light to the local light.

7. The lighting system according to claim 1 , wherein the control unit is configured to prevent a change in the photosynthetic photon flux density in a first wavelength range of 400-470 nm of the local light at the location within the horticulture production facility of, on average, more than 10 μmol/sec/m 2 over the predetermined period of time, in a second wavelength range of 625-675 nm of the local light at the location within the horticulture production facility of, on average, more than 10 μmol/sec/m 2 over the predetermined period of time, and optionally in a third wavelength range of 675-760 nm of the local light at the location within the horticulture production facility of, on average, more than 10 μmol/sec/m 2 over the predetermined period of time.

8. A horticulture production facility comprising the lighting system according to claim 1 .

9. The horticulture production facility according to claim 8 , comprises a plurality of sensors, configured to sense the photosynthetic photon flux density of the local light at a plurality of locations within the horticulture production facility, wherein the control unit is configured to limit the change in the photosynthetic photon flux density of the local light at each of the plurality of locations.

10. The horticulture production facility according to claim 9 , wherein the horticulture production facility comprises a greenhouse or a horticulture production facility comprising a multi-layer growth system.

11. The horticulture production facility according claim 8 , wherein the control unit is further configured to prevent a change in the spectral light distribution of the local light at the location by controlling the contribution of the horticulture light to the local light to such an extent, that a change in the ratio of intensities between two or more wavelength ranges within the wavelength range of 400-800 nm of the local light maintain within 1:2-2:1 of the intensity of a predetermined wavelength range selected out of the two or more wavelength ranges.