IP Library Granted Patent US 10,201,879
Granted Patent B2
US 10,201,879 · App. 14/425,980 · Granted Feb 12, 2019

Silver paste composition and semiconductor device using same

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Quick Facts
Patent No.
US 10,201,879
App. No.
14/425,980
Granted
Feb 12, 2019
Kind
B2
Abstract

A silver paste composition comprising silver particles having a particle diameter of 0.1 μm to 20 μm, and a solvent, wherein the above-described solvent comprises a solvent having a boiling point of 300° C. or more.

Claims (62)

1. A silver paste composition comprising:

silver particles having a particle diameter of 0.1 μm to 20 μm; and

a solvent component consisting of one or more solvents having a boiling point of 300° C. or more.

2. The silver paste composition according to claim 1 , wherein the silver particles comprise at least one of flaky silver particles and spherical silver particles.

3. The silver paste composition according to claim 1 , wherein one or more of the solvents comprises at least one of an ether bond and an ester bond.

4. A sintered body comprising:

silver sintered particles derived from heating the silver paste composition according to claim 1 at a temperature of less than 300° C., and

having a volume resistivity of 1×10 −4 Ω·cm or less, a thermal conductivity of 30W/m·K or more, and an adhesive strength of 10 MPa or more.

5. A semiconductor device comprising:

a semiconductor element;

a supporting member for mounting the semiconductor element; and

a sintered body derived from the silver paste composition according to claim 1 bonding the semiconductor element to the supporting member.

6. The silver paste composition according to claim 2 , wherein one or more of the solvents comprises at least one of an ether bond and an ester bond.

7. A sintered body comprising:

silver sintered particles derived from heating the silver paste composition according to claim 2 at a temperature of less than 300° C., and

having a volume resistivity of 1×10 −4 Ω·cm or less, a thermal conductivity of 30W/m·K or more, and an adhesive strength of 10 MPa or more.

8. A sintered body comprising:

silver sintered particles derived from heating the silver paste composition according to claim 3 at a temperature of less than 300° C., and

having a volume resistivity of 1×10 −4 Ωcm or less, a thermal conductivity of 30W/m·K or more, and an adhesive strength of 10 MPa or more.

9. A sintered body comprising:

silver sintered particles derived from heating the silver paste composition according to claim 6 at a temperature of less than 300° C., and

having a volume resistivity of 1×10 −4 Ωcm or less, a thermal conductivity of 30W/m·K or more, and an adhesive strength of 10 MPa or more.

10. A semiconductor device comprising:

a semiconductor element;

a supporting member for mounting the semiconductor element; and

a sintered body derived from the silver paste composition according to claim 2 bonding the semiconductor element to the supporting member.

11. A semiconductor device comprising:

a semiconductor element;

a supporting member for mounting the semiconductor element; and

a sintered body derived from the silver paste composition according to claim 3 bonding the semiconductor element to the supporting member.

12. A semiconductor device comprising:

a semiconductor element;

a supporting member for mounting the semiconductor element; and

a sintered body derived from the silver paste composition according to claim 6 bonding the semiconductor element to the supporting member.

13. The silver paste composition according to claim 3 , wherein one or more of the solvents has a hydroxyl group.

14. The silver paste composition according to claim 6 , wherein one or more of the solvents has a hydroxyl group.

15. The silver paste composition according to claim 1 , wherein one or more of the solvents comprises a hydroxyl structure group.

16. The silver paste composition according to claim 2 , wherein one or more of the solvents comprises a hydroxyl structure group.

17. A sintered body comprising:

silver sintered particles derived from heating the silver paste composition according to claim 15 at a temperature of less than 300° C., and

having a volume resistivity of 1×10 −4 Ω·cm or less, a thermal conductivity of 30W/m·K or more, and an adhesive strength of 10 MPa or more.

18. A sintered body comprising:

silver sintered particles derived from heating the silver paste composition according to claim 16 at a temperature of less than 300° C., and

having a volume resistivity of 1×10 −4 Ω·cm or less, a thermal conductivity of 30W/m·K or more, and an adhesive strength of 10 MPa or more.

19. A semiconductor device comprising:

a semiconductor element;

a supporting member for mounting the semiconductor element; and

the sintered body according to claim 17 bonding the semiconductor element to the supporting member.

20. A semiconductor device comprising:

a semiconductor element;

a supporting member for mounting the semiconductor element; and

the sintered body according to claim 18 bonding the semiconductor element to the supporting member.

21. The silver paste composition according to claim 1 , wherein one or more of the solvents has a boiling point of 305° C. or more.

22. A silver paste composition comprising:

metal containing materials consisting of silver particles having a particle diameter of 0.1 μm to 20 μm; and

a solvent component consisting of one or more solvents having a boiling point of 300° C. or more.

23. A silver paste composition consisting of:

silver particles having a particle diameter of 0.1 μm to 20 μm; and

one or more solvents having a boiling point of 300° C. or more.

24. The silver paste composition according to claim 23 , wherein the one or more solvents has a boiling point of more than 300° C.

25. The silver paste composition according to claim 22 , wherein the solvent component consists of one or more solvents having a boiling point of more than 300° C.

26. The silver paste composition according to claim 1 , wherein the solvent component consists of one or more solvents having a boiling point of more than 300° C.

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
CHANGE OF NAME Recorded Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 26, 2015
From: ISHIKAWA, DAI; MATSUMOTO, HIROSHI; NATORI, MICHIKO; NAKAKO, HIDEO; TANAKA, TOSHIAKI
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 035261/0783 →