Methods and systems for fast imprinting of nanometer scale features in a workpiece
The subject matter described herein relates to methods and systems for fast imprinting of nanometer scale features in a workpiece. According to one aspect, a system for producing nanometer scale features in a workpiece is disclosed. The system includes a die having a surface with at least one nanometer scale feature located thereon. A first actuator moves the die with respect to the workpiece such that the at least one nanometer scale feature impacts the workpiece and imprints a corresponding at least one nanometer scale feature in the workpiece.
1. A method for producing nanometer scale features in a workpiece, the method comprising:
providing a die having a surface with at least one nanometer scale feature located thereon;
using a first actuator, moving the die with respect to the workpiece such that the at least one nanometer scale feature impacts the workpiece and imprints a corresponding at least one nanometer scale feature in the workpiece;
wherein using the first actuator to move the die comprises using the first actuator to move the die in an elliptical path to reduce smearing of the at least one nanometer scale feature imprinted in the workpiece; and
wherein the first actuator comprises a piezoelectric material and a beam, wherein moving the die comprises exciting the piezoelectric material to move the beam at a frequency that is below a resonant frequency of the beam.
2. The method of claim 1 comprising using a second actuator for moving the workpiece and wherein the first actuator reciprocatingly moves the die to repeatedly imprint nanometer scale features at different locations in the workpiece.
3. The method of claim 2 wherein moving the die comprises exciting the first actuator to move the die a frequency of 1 kHz to form 1000 imprints per second in the workpiece.
4. The method of claim 3 wherein the die includes at least 1600 features such that the 1000 imprints per second forms at least 1.6 million nanometer scale features per second in the workpiece.
5. The method of claim 1 wherein the workpiece comprises a substantially flat surface.
6. The method of claim 1 wherein the workpiece comprises a sidewall of a substantially cylindrical surface.
7. The method of claim 1 wherein the workpiece comprises a mold.
8. The method of claim 7 comprising using the mold to form a sheet of antireflective material having nanometer scale features corresponding to the nanometer scale features imprinted in the mold.
9. The method of claim 8 wherein the antireflective material comprises a cover for a photovoltaic array.
10. The method of claim 1 wherein the at least one nanometer scale feature has a dimension that is less than a wavelength of visible light.
11. The method of claim 1 wherein at least one nanometer scale feature includes a dimension that falls within a range of 400 nm to 600 nm.
12. A method for producing nanometer scale features in a workpiece, the method comprising:
providing a die having a surface with at least one nanometer scale feature located thereon;
using a first actuator, moving the die with respect to the workpiece such that the at least one nanometer scale feature impacts the workpiece and imprints a corresponding at least one nanometer scale feature in the workpiece; and
wherein the first actuator comprises a piezoelectric material and a beam, wherein moving the die comprises exciting the piezoelectric material to move the beam at a resonant frequency of the beam in two directions.
13. The method of claim 12 wherein moving the beam comprises exciting the piezoelectric material to move the beam at a resonant frequency of 45 kilohertz in a bending direction and 50 kilohertz in a longitudinal direction.