IP Library Granted Patent US 10,074,506
Granted Patent B2
US 10,074,506 · App. 14/434,824 · Granted Sep 11, 2018

Method for manufacturing electron source

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Quick Facts
Patent No.
US 10,074,506
App. No.
14/434,824
Granted
Sep 11, 2018
Kind
B2
Abstract

A conventional method to process a tip fails to designate the dimension of the shape of the end of the tip, and so fails to obtain a tip having any desired diameter. Impurities may be attached to the tip. Based on a correlation between the voltage applied or the time during processing of the end of the tip and the diameter of the tip end, the applied voltage is controlled so as to obtain a desired diameter of the tip end for processing of the tip. This allows a sharpened tip made of a tungsten monocrystal thin wire to be manufactured to have any desired diameter in the range of 0.1 μm or more and 2.0 μm or less.

Claims (27)

1. A method for manufacturing an electron source including: a tip prepared by sharpening an end of a thin wire like a needle; and a heating element to heat the tip, comprising:

disposing the tip and the heating element in a vacuum vessel;

heating the heating element by applying current to the heating element;

applying voltage between the tip and an electrode disposed opposed to the tip and adjusting the voltage based on a relationship acquired beforehand between a diameter of the end and the voltage to process the end of the tip to have a desired size; and

monitoring a variation over time of an amount of emission current from the tip during processing of the tip, and ending the processing of the tip when the emission current becomes constant.

2. The method for manufacturing an electron source according to claim 1 , wherein the voltage is adjusted based on a relationship of a first-order linear function between the voltage and a size of the end of the tip after processing so as to process the end of the tip to have a desired size.

3. The method for manufacturing an electron source according to claim 1 , wherein the tip is processed so that the diameter of the end is in a range of 0.1 μm or more and 2.0 μm or less.

4. The method for manufacturing an electron source according to claim 1 , wherein the tip includes tungsten monocrystal or tungsten polycrystal whose axial orientation is <100>.

5. The method for manufacturing an electron source according to claim 1 , wherein

pressure in the vacuum vessel is 10 −4 Pa or more to sharpen the tip.

6. The method for manufacturing an electron source according to claim 1 , wherein the tip during processing is heated in a temperature range from 1,500 K to 2,000 K.

7. The method for manufacturing an electron source according to claim 1 , wherein processing time of the tip is determined based on current emitted from the tip.

8. The method for manufacturing an electron source according to claim 1 , wherein processing is performed so that the end of the tip has a conical part having an angle of 10° or less.

9. The method for manufacturing an electron source according to claim 1 , wherein after processing of the end of the tip, the tip is heat-treated in a range from 2,000 K to 2,500 K.

10. The method for manufacturing an electron source according to claim 9 , wherein the end of the tip is adjusted in size by changing time of the heat treatment.

11. A method for manufacturing an electron source including: a tip prepared by sharpening an end of a thin wire like a needle; and a heating element to heat the tip, comprising:

disposing the tip and the heating element in a vacuum vessel;

heating the heating element by applying current to the heating element;

applying voltage between the tip and an electrode disposed opposed to the tip and adjusting time to apply the voltage based on a relationship acquired beforehand between a diameter of the end and the time to apply the voltage to process the end of the tip to have a desired size; and

monitoring a variation over time of an amount of emission current from the tip during processing of the tip, and ending the processing of the tip when the emission current becomes constant.

12. The method for manufacturing an electron source according to claim 11 , wherein the tip is processed so that the diameter of the end is in a range of 0.1 μm or more and 2.0 μm or less.

13. The method for manufacturing an electron source according to claim 11 , wherein the tip includes tungsten monocrystal or tungsten polycrystal whose axial orientation is <100>.

14. The method for manufacturing an electron source according to claim 11 , wherein pressure in the vacuum vessel is 10 −4 Pa or more to sharpen the tip.

15. The method for manufacturing an electron source according to claim 11 , wherein the tip during processing is heated in a temperature range from 1,500 K to 2,000 K.

16. The method for manufacturing an electron source according to claim 11 , wherein processing is performed so that the end of the tip has a conical part having an angle of 10° or less.

17. The method for manufacturing an electron source according to claim 11 , wherein after processing of the end of the tip, the tip is heat-treated in a range from 2,000 K to 2,500 K.

18. The method for manufacturing an electron source according to claim 17 , wherein the end of the tip is adjusted in size by changing time of the heat treatment.

Assignments (3)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 14, 2018
From: CHO, BOKUREI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 046880/0160 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 3, 2018
From: ICHIMURA, TAKASHI; NITTA, HISAO; SONOBE, NOBUYUKI; MURAKOSHI, HISAYA
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 046553/0641 →