Thin film transistor, method for manufacturing the same, array substrate, and display device
View Patent ↗The present disclosure provides a thin film transistor and its manufacturing method, an array substrate, a display device. The thin film transistor includes a gate electrode, a gate insulating layer, an active layer, a source electrode and a drain electrode. The source electrode and the drain electrode are formed above the active layer and located at a first end and a second end of the active layer which are opposite to each other, respectively. The drain electrode completely covers the second end of the active layer.
1. A thin film transistor, comprising a gate electrode, a gate insulating layer, an active layer, a source electrode and a drain electrode,
wherein the source electrode and the drain electrode are formed above the active layer, and located at a first end and a second end of the active layer which are opposite to each other, respectively; and
the drain electrode completely covers the second end of the active layer,
wherein the drain electrode comprises a covering electrode and a contacting electrode connected to each other, the covering electrode completely covers the second end of the active layer and is of a width in a longitudinal direction greater than or equal to that of the active layer, the contacting electrode is configured to contact a pixel electrode and is of a width in the longitudinal direction greater than that of the covering electrode, the longitudinal direction is perpendicular to a connecting line between the first end and the second end of the active layer.
2. The thin film transistor according to claim 1 , wherein the drain electrode is of a rectangular shape.
3. The thin film transistor according to claim 1 , wherein the drain electrode further comprises a connecting electrode located between the covering electrode and the contacting electrode and connected to the covering electrode and the contacting electrode respectively, wherein
the connecting electrode at least partially overlaps the gate electrode and is of a width in the longitudinal direction smaller than that of the covering electrode.
4. The thin film transistor according to claim 3 , wherein the covering electrode and the connecting electrode are connected in a T form or an L form.
5. The thin film transistor according to claim 1 , wherein the covering electrode is of a rectangular shape.
6. The thin film transistor according to claim 1 , wherein the covering electrode is of a shape of a Chinese character “ ” with an opening towards the source electrode.
7. The thin film transistor according to claim 3 , wherein the contacting electrode is of a width in the longitudinal direction greater than or equal to that of the connecting electrode.
8. The thin film transistor according to claim 1 , wherein the source electrode completely covers the first end of the active layer.
9. The thin film transistor according to claim 1 , wherein the source electrode comprises a first electrode, a second electrode and a third electrode; the second electrode is located between the first electrode and the third electrode, and connected to the first electrode and the third electrode respectively;
the first electrode completely covers the first end of the active layer;
the second electrode at least partially overlaps the gate electrode and is of a width in the longitudinal direction smaller than that of the first electrode and the second electrode respectively.
10. The thin film transistor according to claim 9 , wherein the first electrode and the second electrode are connected in a T form or an L form.
11. The thin film transistor according to claim 9 , wherein the first electrode is of a rectangular shape.
12. The thin film transistor according to claim 9 , wherein the first electrode is of a shape of a Chinese character “ ” with an opening towards the drain electrode.
13. An array substrate, comprising the thin film transistor according to claim 1 .
14. A display device, comprising the array substrate according to claim 13 .
15. A method for manufacturing a thin film transistor, comprising a step of forming a gate electrode, a gate insulating layer, an active layer, a source electrode and a drain electrode,
wherein the source electrode and the drain electrode are formed above the active layer, and located at a first end and a second end of the active layer which are opposite to each other, respectively,
the drain electrode completely covers the second end of the active layer,
wherein the drain electrode comprises a covering electrode and a contacting electrode connected to each other, the covering electrode completely covers the second end of the active layer, and is of a width in a longitudinal direction greater than or equal to that of the active layer; the contacting electrode is configured to contact a pixel electrode; and is of a width in the longitudinal direction greater than that of the covering direction is perpendicular to a connecting line between the first end and the second end of the active layer.